Abstract: A method of determining a prothrombin time is disclosed. A mediator is applied to a stratum corneum. The stratum corneum is penetrated to allow the mediator to enter a region containing interstitial fluid and interact with at least one capillary, causing blood and/or blood components to leak from the at least one capillary into the region containing interstitial fluid. A characteristic affected by the blood and/or blood components is measured in the region containing interstitial fluid which correlates to the prothrombin time. A system for measuring prothrombin time is also disclosed. The system has a mediator, one or more microneedles, and a processor directly or indirectly coupled to the one or more microneedles and configured to determine a coagulation change in blood or blood components in a region around the one or more microneedles after the one or more microneedles penetrate a stratum corneum.

Abstract: A blood monitoring system is capable of monitoring the blood of a subject in vivo. The blood monitoring system comprises: 1) an array of movable microneedle micromachined within associated wells; 2) array of motion actuators able to move each needle in and out of their associated wells; 3) array of microvalves associated with each microneedle able to control the flow of air around the microneedle; 4) an array of chemical sensors inserted into patient by movable microneedles; 5) an array of inductors able to measure chemical concentration in the vicinity of inserted chemical sensors; 6) conducting vias that provide timed actuating signal signals from a control system to each motion actuator; 7) conducting vias that transmit signal produced by array of chemical sensors to the control system for processing, although the blood monitoring system can comprise other numbers and types of elements in other configurations.

Abstract: An allergy testing system includes encapsulated allergens, a microneedle array, and an activation system coupled to the microneedle array and the encapsulated allergens such that the encapsulated allergens are moved into contact with a subject as the microneedle array is moved from a resting position to a penetrating position. A method for determining a degree of reaction to one or more allergens by a patient in a minimally invasive manner is also disclosed. Penetration of one or more microneedles into a skin of the patient is caused. Each of the penetrations into the skin is exposed with an allergen from each of the one or more microneedles. One or more images are captured of each of the penetrations into the skin. Each of the captured images are analyzed to assess the degree of reaction to the specific allergen. Allergic reactivity data is output for at least one of the allergens.

Abstract: An allergy testing system includes encapsulated allergens, a microneedle array, and an activation system coupled to the microneedle array and the encapsulated allergens such that the encapsulated allergens are moved into contact with a subject as the microneedle array is moved from a resting position to a penetrating position. A method for determining a degree of reaction to one or more allergens by a patient in a minimally invasive manner is also disclosed. Penetration of one or more microneedles into a skin of the patient is caused. Each of the penetrations into the skin is exposed with an allergen from each of the one or more microneedles. One or more images are captured of each of the penetrations into the skin. Each of the captured images are analyzed to assess the degree of reaction to the specific allergen. Allergic reactivity data is output for at least one of the allergens.

Abstract: A method of removing polysilicon in preference to silicon dioxide and/or silicon nitride by chemical mechanical polishing. The method removes polysilicon from a surface at a high removal rate while maintaining a high selectivity of polysilicon to silicon dioxide and/or a polysilicon to silicon nitride. The method is particularly suitable for use in the fabrication of MEMS devices.

Abstract: An allergy testing system has a microneedle array. The allergy testing system also has at least one coated allergen. The allergy testing system further has an activation system coupled to the microneedle array such that the at least one coated allergen is moved into contact with a subject as the microneedle array is moved from a resting position to a penetrating position. A method for determining a degree of reaction to one or more allergens by a patient in a minimally invasive manner is disclosed. One or more allergen coated microneedles is caused to penetrate into a skin of the patient. One or more images of at least one of the penetrations into the skin are captured. At least one of the captured images are analyzed to assess the degree of reaction to a specific allergen. Allergic reactivity data is output for at least one of the allergens.

Abstract: The present invention provides a method of removing silicon nitride at about the same removal rate as silicon dioxide by CMP. The method utilizes a polishing slurry that includes colloidal silica abrasive particles dispersed in water and additives that modulate the silicon dioxide and silicon nitride removal rates such that they are about the same. In one embodiment of the invention, the additive is lysine or lysine mono hydrochloride in combination with picolinic acid, which is effective at a pH of about 8. In another embodiment of the invention, the additive is arginine in combination with picolinic acid, which is effective at a pH of about 10.

Abstract: The present invention provides a method of removing silicon nitride in preference to silicon dioxide by CMP. The method utilizes a polishing slurry that includes colloidal silica abrasive particles dispersed in water and an additive that suppresses the silicon dioxide removal rate but enhances the silicon nitride removal rate. In one embodiment of the invention, the additive is lysine, which is effective at a pH of about 9, or arginine, which is effective at a pH of about 8. In another embodiment of the invention, the additive is lysine mono hydrochloride in combination with picolinic acid, which is effective at a pH of about 8, or arginine in combination with picolinic acid, which is effective at a pH of about 9.

Abstract: The present invention provides a method of removing silicon nitride in preference to silicon dioxide by CMP. The method utilizes a polishing slurry that includes colloidal silica abrasive particles dispersed in water and an additive that suppresses the silicon dioxide removal rate but enhances the silicon nitride removal rate. In one embodiment of the invention, the additive is lysine, which is effective at a pH of about 9, or arginine, which is effective at a pH of about 8. In another embodiment of the invention, the additive is lysine mono hydrochloride in combination with picolinic acid, which is effective at a pH of about 8, or arginine in combination with picolinic acid, which is effective at a pH of about 9.

Abstract: The present invention provides a method of removing silicon nitride at about the same removal rate as silicon dioxide by CMP. The method utilizes a polishing slurry that includes colloidal silica abrasive particles dispersed in water and additives that modulate the silicon dioxide and silicon nitride removal rates such that they are about the same. In one embodiment of the invention, the additive is lysine or lysine mono hydrochloride in combination with picolinic acid, which is effective at a pH of about 8. In another embodiment of the invention, the additive is arginine in combination with picolinic acid, which is effective at a pH of about 10.

Abstract: A method of removing polysilicon in preference to silicon dioxide and/or silicon nitride by chemical mechanical polishing. The method removes polysilicon from a surface at a high removal rate while maintaining a high selectivity of polysilicon to silicon dioxide and/or a polysilicon to silicon nitride. The method is particularly suitable for use in the fabrication of MEMS devices.