Patents Assigned to Innovative Sputtering Technology
  • Patent number: 6975453
    Abstract: The present invention comprises a multilayer inorganic anti-reflective coating with predetermined optical properties, for application on a flexible substrate. The coating comprises a stack consisting of five material layers, whereby the third layer is a dummy layer consisting of an electrically conductive material, preferably indium-tinoxyde, which provides the coating with an adjustable electrical sheet resistance of between 25 and 2000 ?/sq without thereby influencing its optical properties. The anti-reflective coating can be applied onto a flexible substrate (e.g. a polymer film) by means of a single 12 or double pass vacuum magnetron sputtering operation.
    Type: Grant
    Filed: October 27, 1998
    Date of Patent: December 13, 2005
    Assignee: Innovative Sputtering Technology
    Inventors: Paul Lippens, Peter Persoone
  • Patent number: 6123787
    Abstract: The invention relates to a process for manufacturing a pore free powder metallurgical alloy article starting with a minor portion of Sn powder and a major portion of In.sub.2 O.sub.3 powder and comprising the steps of: substantially uniformly distributing and fixing the Sn powder on the surface of the In.sub.2 O.sub.3 powder by mixing and milling the powders in the presence of a process controlling agent such as an alcohol to form alloyed powders, and compacting the so alloyed powders at high temperature to form the article. The article has a good electrical conductivity and is usable as a target for plasma sputtering ITO compositions.
    Type: Grant
    Filed: June 12, 1998
    Date of Patent: September 26, 2000
    Assignee: Innovative Sputtering Technology
    Inventors: Paul Lippens, Ludo Froyen, Louis Buekenhout
  • Patent number: 5790030
    Abstract: An antipiliferage tag comprising a soft-magnetic thin film (100) for use as an active element in an electronic article surveillance (E.A.S.) system. The film (100) has an easy axis (102) with a particular direction. The tag has been folded along at least one folding line (104) so that the tag comprises at least two layers which at least partially overlap with each other. The folding line (104) forms an oblique angle different from zero with the direction of the easy axis (102) so that the direction of the easy axis (102) in one layer is different from the direction of the easy axis (106) in another layer. In this way an antipiliferage tag which is insensitive to its orientation in a detection gate of an E.A.S. system is obtained.
    Type: Grant
    Filed: May 8, 1996
    Date of Patent: August 4, 1998
    Assignee: Innovative Sputtering Technology
    Inventors: Hugo Lievens, Paul Lippens, Pascal Verheyen