Patents Assigned to Innovative Sputtering Technology N.V. (I.S.T.)
  • Patent number: 5904966
    Abstract: A laminated structure is obtained by hot isostatic pressing. The structure comprises a first metallic outer layer (produced by powder metallurgy) on one side, a second metallic outer layer on the other side which can form a brittle intermetallic phase and/or a brittle ordered phase with the first side, and a ductile metallic intermediate layer, the layers possessing mutually different coefficients of thermal expansion, whereby the intermediate layer acts as a diffusion barrier against the formation of the aforementioned brittle intermetallic phases or ordered phases. The invention also concerns a manufacturing method for the structure and an application of same as a cathode in a plasma sputtering unit.
    Type: Grant
    Filed: March 22, 1996
    Date of Patent: May 18, 1999
    Assignee: Innovative Sputtering Technology N.V. (I.S.T.)
    Inventor: Paul Lippens