Patents Assigned to Inoac Technical Center
  • Publication number: 20220389292
    Abstract: A laminate 10 includes: a foamed polyurethane layer 11 obtained from a foamable polyurethane resin composition containing an active hydrogen group-containing tin ricinoleate and a phosphorus-containing solid flame retardant; and a coating layer 15 adhered to the foamed polyurethane layer 11 by a polyurethane hot melt adhesive 13 containing a polyurethane prepolymer (I) obtained by using a polyol component (A) and a polyisocyanate component (B) as raw materials, and a catalyst (II).
    Type: Application
    Filed: August 5, 2022
    Publication date: December 8, 2022
    Applicants: INOAC CORPORATION, INOAC TECHNICAL CENTER CO., LTD.
    Inventors: Yuya NAGANO, Hideo OTA, Takahiro INOUE, Shimpei TOKAI
  • Patent number: 11440286
    Abstract: The present invention provides a laminate 10 including: a foamed polyurethane layer 11 obtained from a foamable polyurethane resin composition containing an active hydrogen group-containing tin ricinoleate and a phosphorus-containing solid flame retardant; and a coating layer 15 adhered to the foamed polyurethane layer 11 by a polyurethane hot melt adhesive 13 containing a polyurethane prepolymer (I) obtained by using a polyol component (A) and a polyisocyanate component (B) as raw materials, and a catalyst (II).
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: September 13, 2022
    Assignees: INOAC CORPORATION, INOAC TECHNICAL CENTER CO., LTD.
    Inventors: Yuya Nagano, Hideo Ota, Takahiro Inoue, Shimpei Tokai
  • Patent number: 11248102
    Abstract: A roll excellent in abrasion resistance, which contains: a resin layer containing a first atom group having a plurality of sulfur atoms, a plurality of second atom groups having a carbon chain that has a plurality of carbon atoms arranged in a line and has an end bonded to any one of the plurality of sulfur atoms, and a plurality of third atom groups each of which has a urethane bond and is bonded to any one of the plurality of second atom groups; and a cylindrical foamed resin having an outer surface covered with the resin layer.
    Type: Grant
    Filed: December 9, 2016
    Date of Patent: February 15, 2022
    Assignee: INOAC TECHNICAL CENTER CO.. LTD.
    Inventors: Takayuki Suzuki, Minoru Ubukata, Takuya Ito
  • Publication number: 20200316905
    Abstract: The present invention provides a laminate 10 including: a foamed polyurethane layer 11 obtained from a foamable polyurethane resin composition containing an active hydrogen group-containing tin ricinoleate and a phosphorus-containing solid flame retardant; and a coating layer 15 adhered to the foamed polyurethane layer 11 by a polyurethane hot melt adhesive 13 containing a polyurethane prepolymer (I) obtained by using a polyol component (A) and a polyisocyanate component (B) as raw materials, and a catalyst (II).
    Type: Application
    Filed: December 21, 2018
    Publication date: October 8, 2020
    Applicants: INOAC CORPORATION, INOAC TECHNICAL CENTER CO., LTD.
    Inventors: Yuya NAGANO, Hideo OTA, Takahiro INOUE, Shimpei TOKAI
  • Publication number: 20190332051
    Abstract: A roll excellent in abrasion resistance, which contains: a resin layer containing a first atom group having a plurality of sulfur atoms, a plurality of second atom groups having a carbon chain that has a plurality of carbon atoms arranged in a line and has an end bonded to any one of the plurality of sulfur atoms, and a plurality of third atom groups each of which has a urethane bond and is bonded to any one of the plurality of second atom groups; and a cylindrical foamed resin having an outer surface covered with the resin layer.
    Type: Application
    Filed: December 9, 2016
    Publication date: October 31, 2019
    Applicant: INOAC TECHNICAL CENTER CO., LTD.
    Inventors: Takayuki SUZUKI, Minoru UBUKATA, Takuya ITO
  • Patent number: 6652787
    Abstract: The present invention provides a wiping material for a vacuum chamber having sufficient sludge wiping properties and water retention attained by easy control over cell diameter and use of a polyurethane foam which has been foamed free from a silicone-based surface active agent and a process for the production thereof. A wiping material made of a polyurethane foam for a vacuum chamber for use in the preparation of a silicon wafer is described, wherein the polyurethane foam is free of silicone and has an open-cell structure comprising cells the diameter of which are controlled to fall within the range of from 500 &mgr;m to 3,000 &mgr;m.
    Type: Grant
    Filed: June 26, 2001
    Date of Patent: November 25, 2003
    Assignees: Inoac Corporation, Inoac Technical Center
    Inventor: Yukio Sato