Abstract: The present invention concerns a compound of following general formula (I): where: either R is an R1 group and R? is an -A1-Cy1 group, or R is an -A1-Cy1 group and R? is an R1 group, R1 particularly being H or (C1-C6)alkyl group; A1 being an —NH— radical or —NH—CH2— radical; Cy1 particularly being a phenyl group, A is a fused (hetero)aromatic ring having 5 to 7 atoms, for use for treating cancer.
Type:
Grant
Filed:
May 23, 2018
Date of Patent:
March 19, 2024
Assignees:
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFQUE, UNIVERSITE D'ORLEANS, UNIVERSITE DE TOURS, INSTITUT NATIONAL DE LA SANTE ET DE LA RECHERCHE SCIENTIFIQUE (INSERM), CHU NANTES
Inventors:
Sylvain Routier, Frédéric Buron, Nuno Rodrigues, Gaëlle Fourriere-Grandclaude, Christophe Vandier, Aurélie Chantome, Marie Potier-Cartereau, Maxime Gueguinou, Séverine Marionneau-Lambot
Abstract: The invention relates to a method for depositing nanometric filamentary structures. The method comprises passing a gaseous phase comprising the nanometric filamentary structures through a space defined between at least two electrodes generating an electric field, for depositing the nanometric filamentary structures on at least one of the electrodes; and at least substantially preventing the deposited nanometric filamentary structures from bridging the electrodes during the deposition. The invention also relates to an apparatus for depositing nanometric filamentary structures as well as to methods and apparatuses for monitoring the production of nanometric filamentary structures.
Type:
Grant
Filed:
June 28, 2010
Date of Patent:
December 11, 2012
Assignee:
Institut National de la Recherche Scientifque
Inventors:
Frédéric Larouche, Olivier Smiljanic, Barry L. Stansfield