Abstract: Method of transporting and processing of substrates. Particularly, transporting the substrate in a double floating mode within a confined passageway and selectively rotating the substrate within the passageway by applying pressurized fluid medium across the planar surface of the substrate. Processing of the substrate may be accomplished during the rotating by directing processing agents such as cleaning medium, rinsing medium, developing agent, etching agent, and the like, onto a surface of the substrate.

Abstract: This invention relates to method and apparatus of transporting and coating substrates within a confined longitudinal passageway. The method is characterized by the transport and coating of substrates without human or mechanical contact. The method includes supplying a fluid medium into the confined passageway and discharging the fluid medium from the passageway, such that the moving fluid cushions while longitudinally transporting the substrate within the passageway.

Abstract: Method of transporting and processing of substrates, including wafers of the type used for semiconductors. Particularly, a method of flowing fluid medium longitudinally within a confined passageway so that the substrate is supported, transported and processed in a double floating condition without touching the walls of the passageway. The method is characterized by the restricting of flowing of fluid medium into the passageway, so as to guide the substrate during transport and processing by injecting pressurized coating medium into the passageway at a series of processing stations defined intermediate transport sections of said passageway.

Abstract: Module for processing advancing substrates including an elongated housing enclosing pairs of superposed transporters defining a longitudinal passage; a source of pressurized gaseous transport medium communicating with the longitudinal passage, so as to provide a free floating transport of the substrates through the passage; and a series of processing chambers interposed between the pairs of transporters, so that a non-processing side and a processing side of the advancing substrates are exposed within the processing chamber. A plurality of gaseous transport medium discharge ducts extends laterally across the longitudinal passage above and below the substrates so as to collect and remove excess gaseous transport medium, while assisting the advance of the substrates in the passage.

Abstract: Improved installation (10), whereby in a first section (22) coating (24) is applied on substrate (14), moving through a passage (16) under double floating condition, in a following section (26) a layer fluid (28) is applied on said layer coating (24) and in the following sections (30) and (32) the removal takes place of said fluid layer with thereafter a drying of the remaining coating layer.

Abstract: Method of transporting and processing substrates with developing agent within a confined passage. Pressurized fluid medium is supplied and discharged on both sides of the substrate via sequentially located fluid medium supply and discharge channels intersecting the top and bottom of the passage, such that the moving fluid medium cushions the substrate and both sides of the substrate remain free of the passage. Developing agent is introduced via a developing agent supply channel intersecting the passage.