Abstract: The invention relates to a method for receiving and/or transporting substrates, wherein, by means of at least one sensor, a deviation of the position of a substrate, in particular of a substrate arranged in a slot of a container, is detected at least with respect to one degree of freedom and a movement course of at least one receiving device and/or transporting device is determined with the inclusion of said deviation.

Abstract: A method for holding and orienting a wafer having an alignment feature, the method includes gripping a wafer with an end effector attached to an end of a robot arm, the end effector including a gripping mechanism which includes a first contacting member, a second contacting member, and a drive element, and wherein gripping includes increasing and decreasing the space between the first and second contacting members, the method also including rotating the wafer about an axis that is perpendicular to the plane of the wafer and sensing the alignment feature on the wafer as the gripping mechanism rotates the wafer.

Abstract: An apparatus for holding and orienting a wafer having an alignment feature, and including a movable robot arm; and an end effector attached to an end of the robot arm, the end effector including a gripping mechanism which during operation both holds the wafer and rotates it about an axis that is perpendicular to the plane of the wafer and a sensing element for detecting the alignment feature on the wafer as the gripping mechanism rotates the wafer past the sensing element.