Abstract: A knowledge based, computer-aided system and method is disclosed for simulating any set of linear or nonlinear simultaneous parametric dependencies. The preferred embodiment creates a model and provides an estimate of the material properties of materials comprising thin films disposed on semiconductor materials. However the system and method are suitable for creating a model and providing an estimate of the physical properties of materials undergoing other material fabrication processes that are dependent on several parameters. The method is suitable for implementation on exisitng general purpose computers.