Abstract: The present patent application is related to a hydrogel composition which is essentially free of active drugs for the manufacture of a product for the treatment of dermatological disorders, especially perioral dermatitis, acne or seborrheic dermatitis.

Abstract: The present patent application is related to a hydrogel composition which is essentially free of active drugs for the manufacture of a product for the treatment of dermatological disorders, especially perioral dermatitis, acne or seborrheic dermatitis.

Abstract: The present invention related to the use of a pharmaceutical composition which is essentially free of pharmaceutically active ingredients for the treatment of human skin, especially in the treatment of rosacea, acne, atopic dermatitis, contact dermatitis, perioral dermatitis, psoriasis or neurodermitis, as well as for prophylactic and/or cosmetic purposes.

Abstract: The current invention describes novel chiral synthetic routes and intermediates for the manufacture of chiral anti-inflammatory agents of general formula VIII in which at least one of the groups X1, X2, X3 is selected from fluoro, chloro, bromo, hydroxy, methoxy, ethoxy, trifluoromethyl, amino whereas the other groups X1, X2, X3 have the meaning of a hydrogen atom, in which at least one of the groups Z1, Z2, Z3 is selected from —O—, —S—, —N(—CH3)—, whereas the other groups Z1, Z2, Z3 have the meaning of a —CH2— group, and in which Ar is an aromatic group.

Abstract: The present invention related to the use of a pharmaceutical composition which is essentially free of pharmaceutically active ingredients for the treatment of human skin, especially in the treatment of rosacea, acne, atopic dermatitis, contact dermatitis, perioral dermatitis, psoriasis or neurodermitis, as well as for prophylactic and/or cosmetic purposes.

Abstract: The present invention related to the use of a pharmaceutical composition which is essentially free of pharmaceutically active ingredients for the treatment of human skin, especially in the treatment of rosacea, acne, atopic dermatitis, contact dermatitis, perioral dermatitis, psoriasis or neurodermitis, as well as for prophylactic and/or cosmetic purposes.

Abstract: The present invention provides a formulation which contains a poorly water soluble pharmaceutically active compound at a concentration of 50 mg per 100 g formulation or above. The solubility is achieved by a mixture of solvents as described herein. Moreover the formulation as described herein may be used as a base formulation to generate a cream, an ointment, a spray, a foam or an oleogel.

Abstract: The present patent application relates to an azelaic acid-comprising pharmaceutical composition, preferably an azelaic acid-comprising gel, with added pigment, which composition can be used, inter alia, for treating rosacea and acne, and also to a process for its preparation.

Abstract: The current invention describes novel chiral synthetic routes and intermediates for the manufacture of chiral anti-inflammatory agents of general formula VIII in which at least one of the groups X1, X2, X3 is selected from fluoro, chloro, bromo, hydroxy, methoxy, ethoxy, trifluoromethyl, amino whereas the other groups X1, X2, X3 have the meaning of a hydrogen atom, in which at least one of the groups Z1, Z2, Z3 is selected from —O—, —S—, —NH—, —N(—CH3)—, whereas the other groups Z1, Z2, Z3 have the meaning of a —CH2— group, and in which Ar is an aromatic group.

Abstract: The present patent application is related to a hydrogel composition which is essentially free of active drugs for the manufacture of a product for the treatment of dermatological disorders, especially perioral dermatitis, acne or seborrheic dermatitis.

Abstract: The invention relates to a novel composition comprising hemp oil for treating topical diseases, in particular the hand-foot syndrome.

Abstract: The current invention describes novel chiral synthetic routes and intermediates for the manufacture of chiral anti-inflammatory agents of general formula VIII in which at least one of the groups X1, X2, X3 is selected from fluoro, chloro, bromo, hydroxy, methoxy, ethoxy, trifluoromethyl, amino whereas the other groups X1, X2, X3 have the meaning of a hydrogen atom, in which at least one of the groups Z1, Z2, Z3 is selected from —O—, —S—, —NH—, —N(—CH3)—, whereas the other groups Z1, Z2, Z3 have the meaning of a —CH2— group, and in which Ar is an aromatic group.