Patents Assigned to International Busines Machiness Corporation
  • Method and apparatus for surface potential reflection electron mask lithography
    Publication number: 20030183781
    Abstract: A method (and structure) for controlling a beam used to generate a pattern on a target surface includes generating a beam of charged particles and directing the beam to a mask surface and causing the beam to be either absorbed by or reflected from the mask surface, thereby either precluding or allowing the beam to strike the target surface, based on a reflection characteristic of the mask surface.
    Type: Application
    Filed: March 26, 2002
    Publication date: October 2, 2003
    Applicant: International Busines Machiness Corporation
    Inventor: Rudolf M. Tromp