Abstract: To locate a target document generated using a target language but other otherwise synchronized to a source document generated using a different source language, a URL or other document identifier for the source webpage is received and parsed to identify one or more elements; for example, a domain element or a path element. Each of the elements is analyzed to determine whether it includes one or more character strings associated with the source language; e.g., a language name, a language code, a country name and/or a country code. Each such character string is processed to generate a corresponding character string associated with the target language. A list of candidates for a second document identifier is generated and sequentially accessed to find the target document.
Type:
Application
Filed:
November 18, 2008
Publication date:
June 4, 2009
Applicant:
International Business Machines Machines Corporation
Abstract: A method of forming retrograde n-wells and p-wells. A first mask is formed on the substrate and the n-well implants are carried out. Then the mask is thinned, and a deep p implant is carried out with the thinned n-well mask in place. This prevents Vt shifts in FETs formed in the n-well adjacent the nwell-pwell interface. The thinned mask is then removed, a p-well mask is put in place, and the remainder of the p-well implants are carried out.
Type:
Grant
Filed:
April 19, 2002
Date of Patent:
December 23, 2003
Assignee:
International Business Machines Machines Corporation
Inventors:
Matthew J. Breitwisch, Chung H. Lam, James A. Slinkman
Abstract: The present invention is directed to a high-performance irradiation sensitive resists and to a polymer resin composition useful for making the same. In accordance to the present invention, the polymer resin comprises a dual blocked polymer resins. Specifically, the dual blocked polymer resin comprises at least two different acid labile protecting groups which block some, but not all, of the polar functional groups of the polymer resin. a chemically amplified resist system comprising said dual blocked polymer resin; at least one acid generator; and a solvent is also provided herein.
Type:
Grant
Filed:
February 25, 1998
Date of Patent:
October 16, 2001
Assignee:
International Business Machines Machines
Inventors:
Kuang-Jung Chen, Ronald A. DellaGuardia, Wu-Song Huang, Ahmad D. Katnani, Mahmoud M. Khojasteh, Qinghuang Lin
Abstract: A data management system for file and database management including a design control system suitable for use in connection with the design of integrated circuits and other elements of manufacture having many parts which need to be developed in a concurrent engineering environment with inputs provided by users and or systems which may be located anywhere in the world providing a set of control information for coordinating movement of the design information through development and to release while providing dynamic tracking of the status of elements of the bills of materials in an integrated and coordinated activity control system utilizing a control repository which can be implemented in the form of a database (relational, object oriented, etc.) or using a flat file system.
Type:
Grant
Filed:
December 6, 1996
Date of Patent:
March 7, 2000
Assignee:
International Business Machines Machine
Inventors:
Gary Alan Van Huben, Joseph Lawrence Mueller