Abstract: A detector assembly (50) is formed by integrating the electronic processing circuits on a CMOS wafer by stitching a plurality of reticles of at least two different types so as to form an integrated circuit having an array of electronic processing circuits each having a respective sensor input disposed toward a first surface of the wafer and accessible from the first surface via a contact formed near an edge of the integrated circuit. Sensor elements (56) are disposed on the first surface of the respective integrated circuits in the detector whereby an exposed surface of the sensor elements forms a common first electrode towards which incident photons are directed, and an opposite unexposed surface thereof forms multiple second electrodes of opposite polarity to the first electrode each in registration with a corresponding sensor input.
Abstract: A sensor array having a plurality of pixels each including a sensor element coupled to a sensor input (24) of an electronic processing circuit is fabricated by first forming an integrated circuit having at least one array of electronic processing circuits (25, 26) each having a respective sensor input (24) disposed with terminal nodes of the integrated circuit toward a first surface of the wafer. In respect of either each pixel or each terminal node, an electrically conductive via (31) is formed through the wafer (20) extending from either the respective sensor input (24) or from the respective terminal node to a second surface (28) of the wafer opposite the first surface. This allows each electrically conductive via (31) exposed at the second surface of the wafer to serve for connection thereto of either a sensor element or a terminal connection that is electrically connected through the electrically conductive via (31) to the respective sensor input or terminal node.
Abstract: A sensor array having a plurality of pixels each including a sensor element coupled to a sensor input (24) of an electronic processing circuit is fabricated by first forming an integrated circuit having at least one array of electronic processing circuits (25, 26) each having a respective sensor input (24) disposed with terminal nodes of the integrated circuit toward a first surface of the wafer. In respect of either each pixel or each terminal node, an electrically conductive via (31) is formed through the wafer (20) extending from either the respective sensor input (24) or from the respective terminal node to a second surface (28) of the wafer opposite the first surface. This allows each electrically conductive via (31) exposed at the second surface of the wafer to serve for connection thereto of either a sensor element or a terminal connection that is electrically connected through the electrically conductive via (31) to the respective sensor input or terminal node.