Patents Assigned to Ionex/HEI
  • Apparatus for generating high currents of negative ions
    Patent number: 4980556
    Abstract: Disclosed is an apparatus for the generation of large currents of negative ions for use in tandem accelerators, suitable for employment in ion implantation on an industrial production scale. The apparatus includes a high current positive ion source which is coupled to a charge exchange canal where a fraction of the positive ions are transformed into negative ions.
    Type: Grant
    Filed: March 6, 1990
    Date of Patent: December 25, 1990
    Assignee: Ionex/HEI Corporation
    Inventors: John P. O'Connor, Nicholas R. White
  • Ion implantation with variable implant angle
    Patent number: 4745287
    Abstract: A target holder for an ion implantation system is disclosed. The targets are supported on a disk which is mounted on a motor which spins the disk. The motor is in turn mounted on a shaft which makes a reciprocating scanning movement along its axis. The spinning of the disk and the reciprocation of the shaft provide uniform exposure of the targets to the incident ion beam. In addition, the shaft can be rotated about its axis to control the angle of incidence of the ion beam as it strikes the targets.
    Type: Grant
    Filed: October 23, 1986
    Date of Patent: May 17, 1988
    Assignee: Ionex/HEI
    Inventor: Norman L. Turner