Abstract: In a secondary ion mass spectroscopic (SIMS) method, and a mass spectrometer for implementing the method, for depth-profiling analysis of alkali metals in a sample which comprises an insulating material or is an insulator. The sample is irradiated by an ion beam as an analysis beam for desorption of secondary ions from the uppermost layers, such that the surface of the sample is removed with the same or a further ion beam. The ion beam used for removal of the sample surface comprises essentially gas clusters or consists of gas clusters.

Abstract: A mass spectrometer includes an ion source for producing a primary ion beam, which has a heatable ion emitter coated by a liquid metal layer essentially comprised of pure metallic bismuth or of a low-melting-point alloy containing, in essence, bismuth. A bismuth ion mixed beam can be emitted by the ion emitter under the influence of an electric field. From said bismuth ion mixed beam, one of a number of bismuth ion types whose mass is a multiple of monatomic singly or multiply charged bismuth ions Bi1p+, is to be filtered out in the form of a mass-pure ion beam that is solely comprised of ions of a type Binp+, in which n?2 and p?1, and n and p are each a natural number.

Abstract: A method is used in a time-of-flight mass spectrometer for analysis of a first pulsed ion beam, the ions of which are disposed along the pulse direction, separated with respect to their ion masses. The ions of at least one individual predetermined ion mass or of at least one predetermined range of ion masses can be decoupled from the first pulsed ion beam, as at least one decoupled ion beam, and the first ion beam and the at least one decoupled ion beam are analyzed.

Abstract: A liquid metal ion source for use in an ion mass spectrometric analysis method contains, on the one hand, a first metal with an atomic weight ?190 U and, on the other hand, another metal with an atomic weight ?90 U. One of the two types of ions are filtered out alternately from the primary ion beam and directed onto the target as a mass-pure primary ion beam.

Abstract: A liquid metal ion source for use in an ion mass spectrometric analysis method contains, on the one hand, a first metal with an atomic weight ?190 U and, on the other hand, another metal with an atomic weight ?90 U. One of the two types of ions are filtered out alternately from the primary ion beam and directed onto the target as a mass-pure primary ion beam.

Abstract: A method is used in a time-of-flight mass spectrometer for analysis of a first pulsed ion beam, the ions of which are disposed along the pulse direction, separated with respect to their ion masses. The ions of at least one individual predetermined ion mass or of at least one predetermined range of ion masses can be decoupled from the first pulsed ion beam, as at least one decoupled ion beam, and the first ion beam and the at least one decoupled ion beam are analyzed.

Abstract: A mass spectrometric method according to the Gentle SIMS (G-SIMS) method uses a liquid metal ion source which contains, on the one hand, a first metal with an atomic weight ?190 U and, on the other hand, another metal with an atomic weight ?90 U. One of the two types of ions are filtered out alternately from the primary ion beam and directed onto the target as a mass-pure primary ion beam.

Abstract: The invention relates to a mass spectrometer comprising an ion source for producing a primary ion beam, which has a heatable ion emitter coated by a liquid metal layer essentially comprised of pure metallic Bismuth or of a low-melting-point alloy containing, in essence, Bismuth. A Bismuth ion mixed beam can be emitted by the ion emitter under the influence of an electric field. From the Bismuth ion mixed beam, one of a number of Bismuth ion types whose mass is a multiple of monatomic singly or multiply charged Bismuth ions Bi1p+, is to be filtered out in the form of a mass-pure ion beam that is solely comprised of ions of a type Binp+, in which n?2 and p?1, and n and p are each a natural number.

Abstract: A mass spectrometric method according to the Gentle SIMS (G-SIMS) method uses a liquid metal ion source which contains, on the one hand, a first metal with an atomic weight ?190 U and, on the other hand, another metal with an atomic weight ?90 U. One of the two types of ions are filtered out alternately from the primary ion beam and directed onto the target as a mass-pure primary ion beam.