Abstract: Disclosed is a plasma device including at least two plasma cells, and a command unit, wherein the first and the second electrodes of a given plasma cell are independent from the corresponding first and second electrodes of the contiguous plasma cells. The electrodes of contiguous plasma cells are independently connected to the command unit. The command unit includes a high voltage generator and a radiofrequency generator which are mutually protected by a filtering element.
Type:
Grant
Filed:
August 20, 2021
Date of Patent:
April 14, 2026
Assignees:
INSTITUT SYSTÈMES INDUSTRIELS, HAUTE ECOLE DE SUISSE OCCIDENTALE, VALAIS-WALLIS (HES-SO), IPRINT INSTITUTE
Inventors:
Fritz Bircher, Christoph Ellert, Alain Germanier, David Martinet, Gilbert Gugler, Sebastian Filliger