Patents Assigned to Ishifuku Metal Industry Co., Ltd.
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Patent number: 9127346Abstract: This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.Type: GrantFiled: November 29, 2011Date of Patent: September 8, 2015Assignee: ISHIFUKU METAL INDUSTRY CO., LTD.Inventors: Koichi Hasegawa, Nobuo Ishii
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Patent number: 9077158Abstract: A spark plug for use in an internal combustion engine has a center electrode, an earth electrode, and an electrode chip formed on at least one of the center electrode and the earth electrode. A spark discharge gap is formed between the center electrode and the earth electrode. The electrode chip has a base section, a chromium rich layer formed on at least a part of the base section, and a diffusion layer formed between the base section and the chromium rich layer. The base section contains chromium within a range of 5 to 45 mass %, an element X within a range of 0.5 to 25 mass %, and a remainder composed of tungsten and unavoidable impurity. The chromium rich layer is larger in content of chromium than the base section. The element X contained in the base section is comprised of at least one of molybdenum, silicon, aluminum and lead.Type: GrantFiled: September 30, 2013Date of Patent: July 7, 2015Assignees: DENSO CORPORATION, ISHIFUKU METAL INDUSTRY CO., LTD.Inventors: Yuki Murayama, Nobuo Abe, Yoshinori Doi, Toshiyuki Tomine
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Patent number: 8858877Abstract: This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.Type: GrantFiled: December 3, 2012Date of Patent: October 14, 2014Assignee: Ishifuku Metal Industry Co., Ltd.Inventors: Koichi Hasegawa, Nobuo Ishii
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Publication number: 20140091701Abstract: A spark plug for use in an internal combustion engine has a center electrode, an earth electrode, and an electrode chip formed on at least one of the center electrode and the earth electrode. A spark discharge gap is formed between the center electrode and the earth electrode. The electrode chip has a base section, a chromium rich layer formed on at least a part of the base section, and a diffusion layer formed between the base section and the chromium rich layer. The base section contains chromium within a range of 5 to 45 mass %, an element X within a range of 0.5 to 25 mass %, and a remainder composed of tungsten and unavoidable impurity. The chromium rich layer is larger in content of chromium than the base section. The element X contained in the base section is comprised of at least one of molybdenum, silicon, aluminum and lead.Type: ApplicationFiled: September 30, 2013Publication date: April 3, 2014Applicants: ISHIFUKU Metal Industry Co., Ltd., Denso CorporationInventors: Yuki MURAYAMA, Nobuo ABE, Yoshinori DOI, Toshiyuki TOMINE
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Publication number: 20140049151Abstract: A spark plug has a center electrode and an earth electrode. The center electrode is faced to the earth electrode so that a spark discharging gap is formed between the center electrode and the earth electrode. An electrode chip is formed on at least one of the center electrode and the earth electrode. The electrode chip has a composition comprised of 40 to 60 mol % of aluminum and iridium as a remainder thereof. In the composition of the electrode chip, it is possible to replace part of the iridium with 1 to 20 mol % of at least one metal selected from nickel, iron, cobalt, platinum and rhodium.Type: ApplicationFiled: August 19, 2013Publication date: February 20, 2014Applicants: ISHIFUKU METAL INDUSTRY CO., LTD., DENSO CORPORATIONInventors: Yuki MURAYAMA, Nobuo ABE, Yoshinori DOI, Toshiyuki TOMINE, Shunsuke YOKOTA
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Publication number: 20130094990Abstract: This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.Type: ApplicationFiled: December 3, 2012Publication date: April 18, 2013Applicant: ISHIFUKU METAL INDUSTRY CO., LTD.Inventor: ISHIFUKU METAL INDUSTRY CO., LTD.
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Patent number: 8252127Abstract: This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.Type: GrantFiled: May 6, 2011Date of Patent: August 28, 2012Assignee: Ishifuku Metal Industry Co., Ltd.Inventors: Koichi Hasegawa, Nobuo Ishii
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Patent number: 8158276Abstract: Disclosed are magnetic thin films, sputtering targets and vapor deposition materials, each of which is composed of 40-60 at % of Pt, 40-60 at % of Fe, 0.05-1.0 at % of P and furthermore depending on the occasions, 0.4-19.5 at % of Cu and/or Ni.Type: GrantFiled: August 3, 2007Date of Patent: April 17, 2012Assignee: Ishifuku Metal Industry Co., Ltd.Inventor: Koichi Hasegawa
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Patent number: 8133432Abstract: Provided is a conductive material to be used for a resistor and a sensor, which is enhanced its mechanical strength while maintaining a stable resistance ratio. In the conductive material used for the resistor and the sensor, 400 to 10,000 ppm of Sr is contained in Pt, and the balance is an inevitable impurity. An intermetallic compound phase formed of Pt and Sr is precipitated and dispersed in Pt.Type: GrantFiled: May 27, 2009Date of Patent: March 13, 2012Assignee: Ishifuku Metal Industry Co., Ltd.Inventor: Koichi Hasegawa
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Patent number: 7959746Abstract: This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.Type: GrantFiled: October 8, 2004Date of Patent: June 14, 2011Assignee: Ishifuku Metal Industry Co., Ltd.Inventors: Koichi Hasegawa, Nobuo Ishii
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Publication number: 20090297389Abstract: Provided is a conductive material to be used for a resistor and a sensor, which is enhanced its mechanical strength while maintaining a stable resistance ratio. In the conductive material used for the resistor and the sensor, 400 to 10,000 ppm of Sr is contained in Pt, and the balance is an inevitable impurity. An intermetallic compound phase formed of Pt and Sr is precipitated and dispersed in Pt.Type: ApplicationFiled: May 27, 2009Publication date: December 3, 2009Applicant: ISHIFUKU Metal Industry Co., Ltd.Inventor: Koichi Hasegawa
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Patent number: 7465424Abstract: Provided is a sputtering target material which has a high reflectance and which is excellent in a sulfurization resistance, comprising an Ag alloy prepared by alloying Ag with a specific small amount of the metal component (A) selected from In, Sn and Zn, a specific small amount of the metal component (B) selected from Au, Pd and Pt and, if necessary, a small amount of Cu.Type: GrantFiled: March 15, 2002Date of Patent: December 16, 2008Assignee: Ishifuku Metal Industry Co., Ltd.Inventors: Koichi Hasegawa, Nobuo Ishii, Tomoyoshi Asaki
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Patent number: 6051118Abstract: An electrolytic composite electrode provided with a cathode formed from a drum to be rotated and an anode having a circular-arc inner surface facing the cathode at a certain interval and capable of keeping an electrolytic solution between the anode and the cathode.Type: GrantFiled: September 14, 1998Date of Patent: April 18, 2000Assignees: Ishifuku Metal Industry Co., Ltd., Showa Co., Ltd.Inventors: Tomoyoshi Asaki, Yukio Arai, Toshimi Mori, Teruki Takayasu