Abstract: Provided is a method of manufacturing silica nanowires. The method includes: providing an object to be processed into a reaction chamber; supplying a precursor having a heteroleptic structure, which has a chemical forma SiA2B2 (A and B are different functional groups), into the reaction chamber; supplying an oxygen-containing gas that preferentially reacts with any one of the functional groups A and B of the precursor; and growing an intermediate on a surface of the object to be processed due to a reaction between the precursor and the oxygen-containing gas.