Abstract: A reference-standard device (20) for calibration of measurements of length, comprising a substrate (10) that includes a surface (10a) having at least one calibration pattern (11). According to the invention, this pattern comprises a plurality of nanometric structures (14), said nanometric structures (14) having one and the same section in the plane of said surface and having the same nanometric dimensions, in particular less than 50 nm, said nanometric structures (14) being arranged at a distance from one another by a constant pitch of nanometric length, in particular less than 50 nm, in at least one direction, said nanometric structures (14) being arranged within spatial regions (12) delimited in one or more directions in the plane of the substrate (10), said nanometric structures (14) being obtained via application to said substrate (10) of a process of nanostructuring (100) by means of a mask of block copolymers in order to make calibrations of measurements of length of the order of nanometres.
Type:
Grant
Filed:
May 19, 2017
Date of Patent:
February 28, 2023
Assignee:
Istituto Nazionale di Ricerca Metrologica
Abstract: Disclosed is a method of determining geometric errors in a machine tool or measuring machine having a mobile unit for moving a target within a measuring volume. The method includes the steps of generating a succession of laser beams in different directions by means of an interferometer, and, for each direction, moving the target into a number of points along the beam; measuring, by means of the interferometer, the abscissa of each of the points from an origin located along the direction of the beam; acquiring the coordinates of each of the points by means of the machine; and determining error parameters of the machine on the basis of the abscissas measured by the interferometer, and the coordinates of the points acquired by the machine.
Type:
Grant
Filed:
May 9, 2008
Date of Patent:
May 28, 2013
Assignees:
Hexagon Metrology S.p.A., Istituto Nazionale di Ricerca Metrologica (I.N.RI.M.)