Patents Assigned to Iwatani International Corporation
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Publication number: 20080296592Abstract: A semiconductor light-emitting device includes: a light-emitting semiconductor element arranged on a lead frame; a transparent resin mold covering the light-emitting semiconductor element and the lead frame except a terminal portion of the lead frame; and a reflective surface formed on a bent portion of part of the lead frame. The terminal portion of the lead frame has a terminal structure, which can serve as a combination of a top-view type and a side-view type.Type: ApplicationFiled: January 25, 2008Publication date: December 4, 2008Applicant: Iwatani International Corporation and Iwatani Electronics CorporationInventor: Abe Osamu
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Patent number: 6613112Abstract: LPG storing cylinder (1) has a top portion fixed to a valve block (2) provided with a through hole (4) for attaching a gas take-out nozzle (3). The gas take-out nozzle (3) is attached to the through hole (4) as it is urged with an urging spring (6) for valve closing. A gas take-out passage (7) within the gas take-out nozzle (3) communicates with the nozzle attaching through hole (4) by a window hole (8). A sealing ring (10) is fitted into a portion where the window hole (8) is formed to shut off a communication between an interior area of the gas storing cylinder (1) and the gas take-out passage (7). A guide pipe (12) to communicate the interior area of the cylinder with a valve chamber (5) projects from an inner end wall of the valve block (2) into the interior area of the LPG storing cylinder (1).Type: GrantFiled: March 13, 2000Date of Patent: September 2, 2003Assignee: Iwatani International CorporationInventor: Hitoshi Taniguchi
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Patent number: 6506270Abstract: A heat treatment method of steel is capable of enhancing wear resistance, mechanical properties and dimensional stability of the steel due to the reduction of the retained austenite amount to substantially zero. In the method, an article of the steel is subjected to a quenching and then subzero treatment including cooling it at a cooling rate of 1 to 10° C./min. to a cooling temperature and holding the cooling temperature for a predetermined period of time.Type: GrantFiled: June 19, 2001Date of Patent: January 14, 2003Assignees: Iwatani International Corporation, MMC Kobelco Tool Co., Ltd.Inventors: Kenzo Takashina, Yuji Komori, Kazuaki Tanaka, Masahiro Machida
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Patent number: 6431610Abstract: A tube assembly for communicating water under pressure from a water supply valve and a water fixture inlet tube assembled at a job site, having an elongate corrugated tube with alternating grooves and ridges and cut to length to extend between a water fixture inlet tube and a water supply valve. The tube receives a pair of nuts in opposing relation, and each nut has an interior thread sized for engaging a respective one of a water fixture inlet tube and a water supply valve. A pair of C-clips, each received in a respective one of the grooves in opposing distal end portions of the tube, define bearing surfaces for the nuts. The distal ends of the tube receive a gasket, which are adapted for sealing between the respective distal end of the tube and the water fixture inlet tube and the water supply valve.Type: GrantFiled: October 14, 1999Date of Patent: August 13, 2002Assignees: Beijing Bork Metal Hose, Co., Ltd., Iwatani International Corporation, Iwatani International CorporationInventors: Tetsuya Ohirano, Noboru Ogawa, Yusuke Kato
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Patent number: 6360678Abstract: A method and apparatus for crushing waste gas cans between a pair of rotating rollers installed in a treatment chamber and removing the residual gas and residual liquid from the waste gas cans. The atmosphere in each of a waste gas can loading chamber, which is adjacent to the treatment chamber, the treatment chamber and a discharge chamber is replaced with an inert gas, thereby maintaining the oxygen concentration in the treatment chamber within a low range in which the residual gas will not burn explosively. Crushing of the waste gas cans is carried out while the oxygen concentration in the treatment chamber is within the low range. The pair of rotating rollers have two rotating shafts disposed approximately parallel to each other and sprocket wheels disposed on each rotating shaft at regular spacings.Type: GrantFiled: February 20, 2001Date of Patent: March 26, 2002Assignees: Fuji Car Mfg. Co., Ltd., Iwatani International CorporationInventors: Ikuo Komatsu, Tatsuhiko Hashimoto, Yuji Komori, Junji Saida, Yasumasa Idei
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Publication number: 20020017345Abstract: A heat treatment method of steel is capable of enhancing wear resistance, mechanical properties and dimensional stability of the steel due to the reduction of the retained austenite amount to substantially zero. In the method, an article of the steel is subjected to a quenching and then subzero treatment including cooling it at a cooling rate of 1 to 10° C./min. to a cooling temperature and holding the cooling temperature for a predetermined period of time.Type: ApplicationFiled: June 19, 2001Publication date: February 14, 2002Applicant: IWATANI INTERNATIONAL CORPORATIONInventors: Kenzo Takashina, Yuji Komori, Kazuaki Tanaka, Masahiro Machida
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Patent number: 6344130Abstract: A method for generating highly concentrated ozone gas by adsorbing ozone gas generated by an ozonizer with an absorbent within an adsorption column and then separating highly concentrated ozone gas from the adsorption column. Three adsorption columns are arranged in parallel. Each of the adsorption columns is controlled to repeat four steps of an ozone gas adsorbing step, a stabilizing and pressurizing step, an ozone gas desorbing step and a cooling down step. Each of the ozone gas adsorbing step and the ozone gas desorbing step has operation time set twice the operation time of each of the stabilizing and pressurizing step and the cooling down step. An ozone gas concentrating unit comprises three adsorption columns which are set to operate one after another by ⅓ cycle lag. Highly concentrated ozone gas separated at the desorbing step of each adsorption column is once stored in an ozone gas storage vessel.Type: GrantFiled: November 19, 1999Date of Patent: February 5, 2002Assignee: Iwatani Sangyo Kabushiki Kaisha (Iwatani International Corporation)Inventors: Kunihiko Koike, Goichi Inoue, Tatsuo Fukuda
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Patent number: 6334469Abstract: A connector (1) is provided between both portable LP gas storing cylinders when transferring and charging LP gas from this to that. One retainer (6) for a supplying LP gas cylinder (2) is positioned on an upper surface of a connector main body (5) which houses a flow passage opening and closing valve (4). The other retainer (7) for a receiving LP gas cylinder (3) is arranged on a lower surface of the connector main body (5). The upper surface of the connector main body (5) is opened at a mid portion of the one retainer (6) to provide an LP gas receiving inlet (14), which communicates with an LP gas taking outlet (23) provided by opening the lower surface of the connector main body (5) at a mid portion of the other retainer (7) through the flow passage opening and closing valve (4).Type: GrantFiled: March 13, 2000Date of Patent: January 1, 2002Assignee: Iwatani International CorporationInventor: Hitoshi Taniguchi
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Patent number: 5746841Abstract: A high-concentration ozone gas having a concentration of at least 50 VOL % of ozone in the ozone-oxygen system is acted within the temperature range of a normal temperature to 60.degree. C. on an ultrapurity-gas piping system for use in a semiconductor manufacturing apparatus and the like or on a metal component part for use in an ultrahigh-vacuum apparatus to form a passivation film on the interior metal surface thereof.Type: GrantFiled: March 8, 1996Date of Patent: May 5, 1998Assignee: Iwatani Sangyo Kabushiki Kaisha Iwatani International CorporationInventors: Kunihiko Koike, Goichi Inoue
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Patent number: 5254176Abstract: A method of cleaning the process tube of the CVD apparatus comprising carrying silicon wafers out of the process tube, making temperature in the process tube lower enough than the process temperature, that is, equal to or higher than room temperature, and supplying cleaning gas, in which ClF.sub.3 is contained, into the process tube to react with poly-silicon and amorphous silicon (Si) stuck to that portion of the inner wall of the process tube which is not in the uniformly-heated zone in the process tube, whereby the matters stuck can be removed from the inner wall of the process tube for a shorter time.Type: GrantFiled: February 3, 1992Date of Patent: October 19, 1993Assignees: Tokyo Electron Limited, Iwatani International CorporationInventors: Shigehito Ibuka, Chitoshi Nogami
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Patent number: 5163297Abstract: A device for preventing evaporation of liquefied gas in a liquefied gas reservoir used to cool an EDS detector of an electron microscope or the like is disclosed. A cold head of a cryogenic refrigerator is disposed so as to fit an opening of the top of the liquefied gas reservoir and moreover a temperature measuring instrument or a level gauge is disposed within the liquefied gas reservoir so that the cryogenic refrigerator is automatically operated depending on the temperature within the liquefied gas reservoir or on change in the liquid level of liquefied gas. In the manner vaporized gas is condensed and reliquefied, thus suppressing wasteful dissipation of vaporized gas.Type: GrantFiled: January 15, 1991Date of Patent: November 17, 1992Assignee: Iwatani international CorporationInventors: Masayoshi Yani, Etsuji Kawaguchi, Michio Sugata, Mitsunori Irie
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Patent number: D437526Type: GrantFiled: April 29, 1999Date of Patent: February 13, 2001Assignee: Iwatani International CorporationInventor: Etsushi Umemoto
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Patent number: D443474Type: GrantFiled: November 17, 2000Date of Patent: June 12, 2001Assignee: Iwatani International CorporationInventors: Fumie Shibata, Etsuji Umemoto