Patents Assigned to Japan as represented by President of Tohoku University
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Patent number: 7452709Abstract: Early detection of infectious agents of human prion diseases such as CJD by using an animal model, etc. is needed in order to rapidly determine prion infections in pharmaceuticals such as blood products, foods, or cosmetics. This invention provides a screening method for infectious agents of human or non-human prion diseases in samples, which employs, as an indication, the deposition of the aberrant prion protein in the follicular dendritic cell (FDC) of a non-human animal.Type: GrantFiled: January 31, 2002Date of Patent: November 18, 2008Assignee: Japan as represented by president of Tohoku UniversityInventors: Tetsuyuki Kitamoto, Ichiro Miyoshi, Shirou Mohri
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Patent number: 7144520Abstract: An etching apparatus comprises a workpiece holder (21) for holding a workpiece (X), a plasma generator (10, 20) for generating a plasma (30) in a vacuum chamber (3), an orifice electrode (4) disposed between the workpiece holder (21) and the plasma generator (10, 20), and a grid electrode (5) disposed upstream of the orifice electrode (4) in the vacuum chamber (3). The orifice electrode (4) has orifices (4a) defined therein. The etching apparatus further comprises a voltage applying unit (25, 26) for applying a voltage between the orifice electrode (4) and the grid electrode (5) to accelerate ions from the plasma (30) generated by the plasma generator (10, 20) and to pass the extracted ions through the orifices (4a) in the orifice electrode (4). A first collimated neutral particle beam is generated and applied to the workpiece (X) for etching a surface of a processing layer (60) of the workpiece (X).Type: GrantFiled: November 8, 2002Date of Patent: December 5, 2006Assignees: Ebara Corporation, Japan as Represented by President of Tohoku UniversityInventors: Katsunori Ichiki, Kazuo Yamauchi, Hirokuni Hiyama, Seiji Samukawa
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Patent number: 6909086Abstract: A neutral particle beam processing apparatus comprises a workpiece holder (20) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (3) by applying a high-frequency electric field, an orifice electrode (4) disposed between the workpiece holder (20) and the plasma generator, and a grid electrode (5) disposed upstream of the orifice electrode (4) in the vacuum chamber (3). The orifice electrode (4) has orifices (4a) defined therein. The neutral particle beam processing apparatus further comprises a voltage applying unit for applying a voltage between the orifice electrode (4) which serves as an anode and the grid electrode (5) which serves as a cathode, while the high-frequency electric field applied by the plasma generator is being interrupted, to accelerate negative ions in the plasma generated by the plasma generator and pass the accelerated negative ions through the orifices (4a) in the orifice electrode (4).Type: GrantFiled: March 22, 2002Date of Patent: June 21, 2005Assignees: Ebara Corporation, Japan as represented by President of Tohoku UniversityInventors: Seiji Samukawa, Katsunori Ichiki, Kazuo Yamauchi, Hirokuni Hiyama
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Publication number: 20040119006Abstract: A neutral particle beam processing apparatus comprises a workpiece holder (20) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (3) by applying a high-frequency electric field, an orifice electrode (4) disposed between the workpiece holder (20) and the plasma generator, and a grid electrode (5) disposed upstream of the orifice electrode (4) in the vacuum chamber (3). The orifice electrode (4) has orifices (4a) defined therein. The neutral particle beam processing apparatus further comprises a voltage applying unit for applying a voltage between the orifice electrode (4) which serves as an anode and the grid electrode (5) which serves as a cathode, while the high-frequency electric field applied by the plasma generator is being interrupted, to accelerate negative ions in the plasma generated by the plasma generator and pass the accelerated negative ions through the orifices (4a) in the orifice electrode (4).Type: ApplicationFiled: September 24, 2003Publication date: June 24, 2004Applicants: EBARA CORPORATION, JAPAN AS REPRESENTED BY PRESIDENT OF TOHOKU UNIVERSITYInventors: Seiji Samukawa, Hatsunori Ichiki, Kazuo Yamauchi, Hirokuni Hiyama
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Patent number: 5508616Abstract: At least one transmitting coil 1 and at least one receiving coil 2 are disposed along the bore axis 18 of a borehole 7 such that these coils are inclined and face each other, thus causing these coils to have directivity for examining electric characteristics of a formation around the borehole. More specifically, a method of and an apparatus for directional induction logging are provided, which permit measurement of the electric conductivity distribution of a formation in the circumferential direction in a range of several meters around the borehole and also imaging reflecting the electric conductivity.Type: GrantFiled: November 20, 1993Date of Patent: April 16, 1996Assignees: Sekiyushigen Kaihatsu Kabushiki Kaisha, Japan as Represented By President of Tohoku UniversityInventors: Motoyuki Sato, Hiroaki Niitsuma, Jun Fuziwara, Makoto Miyairi
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Patent number: 4742378Abstract: A junction-type semiconductor light emitting device comprising a plate portion, a column formed on one surface of the plate portion and electrodes provided on each of opposite surfaces of the plate portion including the column wall, the column having a pn junction formed therein and extending perpendicular to the plate portion, the plate portion having a pn junction formed therein and extending in parallel with the plate portion, these pn junctions being connected with each other, the current density through the pn junction in the column being larger than that through the pn junction in the plate portion under the application of a predetermined voltage across the electrodes, so as to facilitate the continuous oscillation of this light emitting device at room temperature with the resultant light emission through the column. The light emitting device can be readily arranged in matrix and readily integrated in high degree.Type: GrantFiled: September 30, 1985Date of Patent: May 3, 1988Assignee: Japan Represented by President of Tohoku UniversityInventors: Hiromasa Ito, Humio Inaba