Abstract: According to one embodiment, a method of manufacturing a display device, includes forming a lower electrode, forming an inorganic insulating layer which covers the lower electrode, forming a partition including a conductive lower part and an upper part on the inorganic insulating layer, forming a resist on the inorganic insulating layer, which is patterned using a photomask comprising an aperture including a pair of first straight portions, a pair of second straight portions, and four arc-shaped corner portions each connecting respective of a first straight portion and a second straight portion adjacent to each other, and forming a rib including a pixel aperture that overlaps the lower electrode by removing a part of the inorganic insulating layer, which is exposed from the resist.

Abstract: According to one embodiment, a manufacturing method includes preparing a substrate with a lower electrode, a rib and a partition, and forming an organic layer and an upper electrode. A first evaporation source used to form a first thin film of the organic layer includes a first nozzle emitting a material toward the substrate relatively moving. A second evaporation source used to form the upper electrode includes a second nozzle emitting a material toward the substrate relatively moving. An axis of at least one of the nozzles inclines to a direction orthogonal to a moving direction of the substrate with respect to a normal direction.

Abstract: According to one embodiment, a manufacturing method of a display device includes preparing a processing substrate by forming a lower electrode, forming a rib, and forming a partition including a lower portion and an upper portion, forming an organic layer on the lower electrode, forming an upper electrode on the organic layer, forming a first transparent layer on the upper electrode, and forming a second transparent layer on the first transparent layer. The first transparent layer and the second transparent layer are formed of organic materials different from each other. A refractive index of the second transparent layer is less than a refractive index of the first transparent layer.

Abstract: According to one embodiment, a display device includes a first common electrode and a second common electrode arranged in a first direction, a first switch unit selectively supplying a first drive signal or a second drive signal different from the first drive signal to the first common electrode, and a second switch unit selectively supplying the first drive signal or the second drive signal to the second common electrode, wherein the second common electrode and the first switch unit are arranged in a second direction intersecting the first direction, the first switch unit comprises a first switch circuit and a second switch circuit arranged in the second direction.

Abstract: According to one embodiment, a camera module includes a liquid crystal panel, an image sensor and an optical system. The liquid crystal panel is configured to display a coded aperture pattern. The optical system is interposed between the liquid crystal panel and the image sensor. The liquid crystal panel includes a liquid crystal layer containing liquid crystal molecules and dichroic dye molecules aligned following the liquid crystal molecules.

Abstract: A lighting device includes a light emitting module and an optical element including first and second liquid crystal cells. Each of the first and second liquid crystal cells includes first and second transparent electrodes extending in a first direction and third and fourth transparent electrodes extending in a second direction. The light emitting module includes a light source, a light guide plate including an end surface into which light emitted from the light source is incident and a first surface from which the light incident into the end surface is emitted, and a prism sheet disposed opposite to the first surface. The second substrate of the first liquid crystal cell and the first substrate of the second liquid crystal cell are adjacent to each other. The first surface includes a plurality of first grooves extending in a third direction intersecting the first direction and the second direction.

Abstract: A semiconductor device includes thin film transistors each having an oxide semiconductor. The oxide semiconductor has a channel region, a drain region, a source region, and low concentration regions which are lower in impurity concentration than the drain region and the source region. The low concentration regions are located between the channel region and the drain region, and between the channel region and the source region. Each of the thin film transistors has a gate insulating film on the channel region and the low concentration regions, an aluminum oxide film on a first part of the gate insulating film, the first part being located on the channel region, and a gate electrode on the aluminum oxide film and a second part of the gate insulating film, the second part being located on the low concentration regions.

Abstract: According to one embodiment, an electronic device includes a liquid crystal panel and a camera. The liquid crystal panel includes a display area, an incident light control area, and an emitted light control area. The camera includes a light-entering surface and a light source. The liquid crystal panel is configured to selectively transmit visible light emitted from the light source in the emitted light control area and to selectively transmit visible light from outside in order to cause visible light to enter the camera from the outside in the incident light control area.

Abstract: A display device includes a substrate, a circuit element layer on the substrate, a display element layer on the circuit element layer, a sealing film on the display element layer, an oxide film on the sealing film, a barrier metal layer on the oxide film, and a wiring layer on the barrier metal layer, wherein a surface of the sealing film in contact with the oxide film has concave/convexities, and the barrier metal layer is formed by titanium nitride. A height of the concave/convexities of the surface of the sealing film may be less than 30 nm. A thickness of the oxide film may be 5 nm or less.

Abstract: The invention allows stable fabrication of a TFT circuit board used in a display device and having thereon an oxide semiconductor TFT. A TFT circuit board includes a TFT that includes an oxide semiconductor. The TFT has a gate insulating film formed on part of the oxide semiconductor and a gate electrode formed on the gate insulating film. A portion of the oxide semiconductor that is covered with the gate electrode 104 and a portion of the oxide semiconductor that is not covered with the gate electrode are both covered with a first interlayer insulating film. The first interlayer insulating film is covered with a first film 106, and the first film is covered with a first AlO film.

Abstract: A transverse electric field type liquid crystal display panel includes a pair of substrates opposed with a liquid crystal layer interposed therebetween. A plurality of sub-pixels having at least one curved portion in a display area are provided in a matrix on one side of the pair of substrates, and a pair of electrodes having at least one curved portion are formed in the plurality of sub-pixels. A light shield layer shielding a non-display area positioned on an outer peripheral side of the display area and between the plurality of sub-pixels is formed on the other side of the pair of substrates. The light shield layer of the non-display area is formed in a shape in which the outermost peripheral side of the display area is rectangular.

Abstract: Disclosed is a display device including a substrate and a plurality of pixels over the substrate. At least one of the plurality of pixels includes a driving transistor and a liquid crystal element electrically connected to the driving transistor. The liquid crystal element has a pixel electrode, an interelectrode insulating film, a common electrode, an inorganic insulating film, a first orientation film, a liquid crystal layer, and a second orientation film. The interelectrode insulating film is located over the pixel electrode. The common electrode is located over the interelectrode insulating film and has a slit overlapping the pixel electrode. The inorganic insulating film is located over the common electrode. The first orientation film is located over the inorganic insulating film. The liquid crystal layer is located over the first orientation film. The second orientation film is located over the liquid crystal layer.

Abstract: According to an aspect, a detection device includes: a plurality of optical sensors that are arranged in a detection area and each of which is configured to output a signal corresponding to light irradiating the optical sensor; a detection circuit configured to be supplied with the signals from the optical sensors; and a control circuit configured to output first data and second data for which detection conditions for acquiring the signals differ from each other. The control circuit is configured to output detection information data in which the detection conditions for the first data and the detection conditions for the second data are added as attribute information to a head of a data string in which the first data and the second data are sequentially arranged.

Abstract: In order to avoid generation of black unevenness caused by the water intrusion into a liquid crystal display device, there is to provide a liquid crystal display device including a display area and a terminal portion, in which a TFT substrate with an organic passivation film formed and an opposite substrate are adhered to each other by a seal portion and a liquid crystal is enclosed there, wherein in the seal portion of the TFT substrate, a groove-shaped through-hole is formed in the organic passivation film to surround the display area, a water absorption layer formed of the same material in the same process as that of the organic passivation film is formed within the groove-shaped through-hole, and the water absorption layer is not covered with the inorganic insulating film.

Abstract: According to one embodiment, a display device includes a first transparent substrate, a display panel, a first fixing member, and a first light source unit. The first transparent substrate has a first light incident surface which is a side surface, and is formed to be curved. The display panel has flexibility. The first fixing member fixes the display panel to the first transparent substrate. The first light source unit is opposed to the first light incident surface to emit light to the first light incident surface.

Abstract: A display device includes a first conductive layer arranged on a first substrate and extending in a first direction, a first insulating film arranged on the first conductive layer, a second conductive layer arranged on the first insulating film and extending in a second direction intersecting the first direction, a second insulating film arranged on the second conductive layer and extending in the first direction and the second direction, a transparent conductive layer arranged on the second insulating film and extending in the first direction and the second direction, a third insulating film arranged on the first conductive layer, and a second substrate opposing the first substrate.

Abstract: According to one embodiment, a substrate includes a display area including a plurality of pixels, a surrounding area that surrounds the display area, and an inspection pad portion provided in the surrounding area, and the inspection pad portion includes a plurality of first pads and a plurality of second pads aligned in a first direction, a plurality of third pads aligned in the first direction, and arranged at positions displaced from the plurality of first pads in a second direction intersecting the first direction, and a plurality of first conductive lines connecting the plurality of first pads with the plurality of third pads, respectively.

Abstract: A display device including a substrate having a first TFT of an oxide semiconductor and a second TFT of a polysilicon semiconductor comprising: the oxide semiconductor is covered by a first insulating film, a first drain electrode is connected to the oxide semiconductor via a first through hole formed in the first insulating film, a first source electrode is connected to the oxide semiconductor via second through hole formed in the first insulating film in the first TFT, a second insulating film is formed covering the first drain electrode and the first source electrode, a drain wiring connects to the first drain electrode via a third through hole formed in the second insulating film, a source wiring is connected to the first source electrode via a fourth through hole formed in the second insulating film.

Abstract: A display device includes: point light sources emitting light of different colors; light guides each of which includes an end face facing a corresponding one of the point light sources, a first surface connected to the end face, and a second surface diagonally facing the end face and the first surface, the light being incident on the end face and undergoing internal reflection, between the first and second surfaces, and linear pattern emission from the first surface; and a display panel including a side surface that faces the first surface and on which the light is incident, front and back surfaces, and a converter that changes a traveling direction of the light, for each pixel of the image, propagating away from the side surface internally between the front and back surfaces, to a direction toward the display surface.

Abstract: Disclosed is an intelligent reflecting surface including a plurality of radio-wave reflecting devices, an adjusting substrate over the plurality of radio-wave reflecting devices, and an anti-reflective film located over the adjusting substrate and configured to absorb radio waves. Each of the plurality of radio-wave reflecting devices includes a pair of substrates and a plurality of radio-wave reflecting elements between the pair of substrates. The anti-reflective film has a lattice shape as a whole. An edge is covered by the anti-reflective film and a portion surrounded by the edge is exposed from the anti-reflective film in each of the plurality of radio-wave reflecting devices. A frequency of the radio waves is equal to or greater than 400 MHz and equal to or less than 50 GHz, for example.