Patents Assigned to JARWON ELECTRONICS CO., LTD.
  • PLASMA ADVANCED WATER TREATMENT APPARATUS
    Publication number: 20140069853
    Abstract: A plasma advanced water treatment apparatus includes a double pipe having a first passage for treated water and a second passage for radical reaction gas, which are separated from each other; a plasma generating means including electrodes arranged at the first and second passages of the double pipe, and a power supply unit connected with the electrodes; and a water tank connected with the double pipe so that the treated water and a radical generation source react with each other.
    Type: Application
    Filed: March 22, 2012
    Publication date: March 13, 2014
    Applicant: JARWON ELECTRONICS CO., LTD.
    Inventors: Jae Hyeok Lee, Min Ki Lee