Patents Assigned to Jet Process Corpo
  • Jet vapor deposition of organic molecule guest-inorganic host thin films
    Patent number: 5720821
    Abstract: A host-guest jet vapor deposition system uses sonic jets and moving substrates to produce host-guest films in which complex organic molecules are trapped in hard, inorganic hosts. The system is capable of film fabrication at high rate and room temperature. Guest molecule concentrations are large and film quality is excellent. Films made in accordance with the present invention have applications in optics and electronics.
    Type: Grant
    Filed: November 15, 1995
    Date of Patent: February 24, 1998
    Assignee: Jet Process Corpo
    Inventor: Bret Halpern