Abstract: An isostatic pressing method for applying silicon powder as an original raw material for silicon crystal growth includes pressing silicon powder having a particle size of 0.1 to 1,000 micrometers into a silicon brick employing cold or hot isostatic pressing to provide a pressed silicon brick; and charging the pressed silicon brick into a furnace for silicon crystal growth. The furnace for silicon crystal growth may be a mono-crystal furnace for growing monocrystalline silicon or a multi-crystal furnace for growing polycrystalline silicon.
Type:
Grant
Filed:
June 22, 2009
Date of Patent:
October 30, 2012
Assignee:
Jiangxi Sai Wei LDK Solar Hi-Tech Co., Ltd.