Abstract: A phase change memory and a method of fabricating the same are provided. The phase change memory includes a lower electrode, an annular heater disposed over the lower electrode, an annular phase change layer disposed over the annular heater, and an upper electrode. The annular phase change layer and the annular heater are misaligned in a normal direction of the lower electrode. The upper electrode is disposed over the annular phase change layer, in which the upper electrode is in contact with an upper surface of the annular phase change layer. The present disclosure simplifies the manufacturing process of the phase change memory, reduces the manufacturing cost, and improves the manufacturing yield. In addition, a contact surface between the heater and the phase change layer of the phase change memory of the present disclosure is very small, so that the phase change memory has an extremely low reset current.

Abstract: An operation method is applied to a memory device. The memory device includes a plurality of memory tiles. The operation method includes following steps: utilizing a first wear leveling process to perform an intra-tile wear leveling on the plurality of memory tiles by a processor; and utilizing a second wear leveling process to perform an inter-tile wear leveling on the plurality of memory tiles by the processor.

Abstract: A method of manufacturing a diode structure includes forming a first stack on a silicon layer on a substrate. A first sidewall spacer extending along and covering a sidewall of the first stack is formed. The silicon layer is selectively etched to a first predetermined depth, thereby forming a second stack. The remaining silicon layer includes a silicon base. A second sidewall spacer extending along and covering a sidewall of the second stack is formed. The silicon base is selectively etched to form a third stack on the substrate. With the second sidewall spacer as a mask, lateral plasma ion implantation is performed. Defects at the interface between two adjacent semiconductor layers can be reduced by the method.

Abstract: A mixed mode memory comprises a memory array, a word line decoder, an intermediary circuit and a reading and writing circuit, wherein the word line decoder is electrically coupled to the memory array, and the intermediary circuit is electrically coupled to the memory array and the writing circuit. The memory array comprises mixed mode memory cells with each cell comprising a reading and writing component group, a storage circuit and a selection circuit. The reading and writing component group is electrically coupled to a word line which controls the reading and writing component group to be conducted or not conducted, and electrically coupled to two bit lines which respectively transmit two data signals. The storage circuit generates two reading response signals based on a reading drive signal. The selection circuit controls the storage circuit to operate in a volatile or non-volatile storage mode based on a selection voltage.

Abstract: Disclosed is a memory drive device. The memory drive device comprises a control circuit, a reference voltage generation circuit, and a first switch. The control circuit is used to generate a first signal according to an input signal. The reference voltage generation circuit comprises a reference resistor and is used to generate a reference signal according to the first signal. The first switch is coupled to a memory resistor and is used to generate a drive signal according to the first signal so as to set a resistance value of the memory resistor. When the input signal is decreased and a resistance value of the memory resistor is greater than a resistance value of the reference resistor, the time when the drive signal is decreased is greater than the time when the reference signal is decreased.

Abstract: A method of manufacturing a phase change memory includes: forming a stacked structure including a conductive layer, a lower electrode layer over the conductive layer, an upper electrode layer, a phase change material between the lower and upper electrode layers, and a selector material between the conductive layer and the lower electrode layer; etching the upper electrode layer to form an upper electrode wire; etching the phase change material according to the upper electrode wire to form a phase change material layer and expose a portion of the lower electrode layer, wherein the phase change material layer has an exposed side surface; after etching the phase change material, performing a nitridizing treatment on the side surface of the phase change material layer to form a nitridized phase change material layer covering the same; and etching the lower electrode layer, the selector material and the conductive layer.

Abstract: A memory driving device, comprising a switch, a voltage setting circuit, and a bias control circuit. The switch is coupled to a memory at a node. The voltage setting circuit is coupled to the switch and configured to provide a set signal during a first period to turn on the switch, so as to generate current flowing through the switch to the memory unit. The bias control circuit is respectively coupled to the switch and the node, and, during a second period, continuously provides a bias signal to control the switch so as to adaptively adjust a value of the setting current of the switch. The configuration setting terminal is coupled to the voltage setting circuit and the bias control circuit to control the first and the second period.

Abstract: A method of manufacturing a phase change memory includes: forming a stacked structure including a conductive layer; a lower electrode layer over the conductive layer; an upper electrode layer over the lower electrode layer; and a phase change material between the lower and upper electrode layers; etching the upper electrode layer according to a first mask to form an upper electrode wire; simultaneously etching the phase change material according to the upper electrode wire and performing a nitridizing treatment in a same plasma etching chamber until a phase change material layer and a nitridized phase change material layer are formed beneath the upper electrode wire and a portion of the lower electrode layer is exposed, wherein the nitridized phase change material layer covers a side surface of the phase change material layer; and removing the portion of the lower electrode layer and the conductive layer therebeneath.

Abstract: A mixed mode memory comprises a memory array, a word line decoder, an intermediary circuit and a reading and writing circuit, wherein the word line decoder is electrically coupled to the memory array, and the intermediary circuit is electrically coupled to the memory array and the writing circuit. The memory array comprises mixed mode memory cells with each cell comprising a reading and writing component group, a storage circuit and a selection circuit. The reading and writing component group is electrically coupled to a word line which controls the reading and writing component group to be conducted or not conducted, and electrically coupled to two bit lines which respectively transmit two data signals. The storage circuit generates two reading response signals based on a reading drive signal. The selection circuit controls the storage circuit to operate in a volatile or non-volatile storage mode based on a selection voltage.

Abstract: A memory test array and a test method thereof are provided. The memory test array includes a first memory array, a second memory array, and a plurality of first common conductive pads. The first memory array includes a plurality of first bit lines and a plurality of first word lines. The second memory array is adjacent to the first memory array and includes a plurality of second bit lines and a plurality of second word lines. Each of the first common conductive pads has a first end and a second end, and the first ends and the second ends are respectively coupled to the first bit lines and the second bit lines, or respectively coupled to the first word lines and the second word lines. The memory test array of the present disclosure can effectively save the area of the memory test chip and make the test process more efficient.

Abstract: A phase change memory and a method of fabricating the same are provided. The phase change memory includes a lower electrode, an annular heater, an annular phase change layer, and an upper electrode. The annular heater is disposed over the lower electrode. The annular phase change layer is disposed over the annular heater, and the annular phase change layer and the annular heater are misaligned in a normal direction of the lower electrode. The upper electrode is disposed over the annular phase change layer. The present disclosure simplifies the manufacturing process of the phase change memory, reduces the manufacturing cost, and improves the manufacturing yield. In addition, a contact surface between the heater and the phase change layer of the phase change memory of the present disclosure is very small, so that the phase change memory has an extremely low reset current.