Patents Assigned to JMAR Research, Inc.
  • Patent number: 6389101
    Abstract: A parallel nanotomography imaging system is provided having an x-ray source, which is preferably a laser-based x-ray source that generates x-rays that are collected using a collector optic and are received in a composite objective assembly. The composite objective assembly includes plural micro-objectives, each imaging the target. The x-ray image is received by an x-ray image formation and acquisition apparatus, and processed and/or displayed.
    Type: Grant
    Filed: May 24, 2000
    Date of Patent: May 14, 2002
    Assignee: JMAR Research, Inc.
    Inventors: Zachary H. Levine, I. C. Edmond Turcu
  • Publication number: 20020018288
    Abstract: Systems and methods are provided for achieving high power and high intensity laser amplification. In a four-pass optical amplifying system, a linear polarized optical beam is directed by various optical elements four times through an optical amplifier. The optical amplifier is transversely pumped by a pumping energy source that includes laser diode arrays. The pumping module and the other optical components are provided to counteract thermal lensing effects, induced thermal birefringence effects and to achieve enhanced amplification and efficiencies.
    Type: Application
    Filed: July 16, 2001
    Publication date: February 14, 2002
    Applicant: JMAR Research, Inc.
    Inventors: Harry Rieger, Serge Cambeau
  • Patent number: 6307913
    Abstract: A shaped plasma discharge system is provided in which a shaped radiation source emits radiation at a desired frequency and in a desired shape. In one embodiment, a laser source provides an output beam at a desired intensity level to shaping optics. The shaping optics alters the output beam into a desired shaped illumination field. In an alternate embodiment, plural laser sources provide plural output beams and the shaping optics can produce a compound illumination field. The illumination field strikes a target material forming a plasma of the desired shape that emits radiation with a desired spatial distribution, at a desired wavelength, preferably in the x-ray, soft x-ray, extreme ultraviolet or ultraviolet spectra. In another embodiment an electric discharge generates the required shaped radiation field. The shaped emitted radiation proceeds through an optical system to a photoresist coated wafer, imprinting a pattern on the wafer.
    Type: Grant
    Filed: October 27, 1999
    Date of Patent: October 23, 2001
    Assignee: Jmar Research, Inc.
    Inventors: Richard M. Foster, Edmond Turcu, Jose M. Sasian, Harry Rieger, James H. Morris
  • Patent number: 6016324
    Abstract: A laser system which generates short duration pulses, such as under five nanoseconds at an energy level of up to a few milli-Joules per pulse (mJ/p) with near diffraction limited beam quality. A laser crystal is pumped (excited) by diode lasers. A resonator having at least two mirror surfaces defines a beam path passing through the laser crystal. The beam path in the resonator is periodically blocked by a first optical shutter permitting pump energy to build up in the laser crystal, except for a short period near the end of each pumping period. While the first optical shutter is open a second optical shutter blocks the light in the resonator except for periodic short intervals, the intervals being spaced such that at least one light pulse traveling at the speed of light in the resonator is able to make a plurality of transits through the resonator, increasing in intensity by extracting energy from the excited laser crystal on each transit.
    Type: Grant
    Filed: April 9, 1998
    Date of Patent: January 18, 2000
    Assignee: JMAR Research, Inc.
    Inventors: Harry Rieger, Henry Shields, Richard Foster