Abstract: A method for removing deposited material from vacuum deposition equipment is disclosed. The method utilizes a low temperature bath, between 40-50 degrees F., to strip sputter depositions, followed by an acid etch step using a low concentration of hydrofluoride acid to remove trace contamination from the surface. Following removal of deposited material, surface texturing of the components is provided.
Abstract: An ultrasonic immersion cleaning tank is constructed to serve as a pass-through between a processing environment and a clean room. The tank is sited as the entryway into a bounded clean room. Particle barriers and positive pressure are utilized to reduce entry of contaminants into the clean room. The components after cleaning are withdrawn from the tank directly into the clean room environment thereby greatly reducing surface contamination thereof.
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