Abstract: Provided are a novel organostannyl silicate compound, a method for preparing the same, a photoresist composition including the organostannyl silicate compound according to the present disclosure, and a method for forming a photoresist pattern using the composition. The organostannyl silicate compound of the present disclosure is industrially very useful, since the compound may implement a photoresist composition having excellent light sensitivity and etching resistance and a high-quality semiconductor device may be manufactured using the composition.

Abstract: Provided is a method for producing (alkyl)arene compounds represented by Formulae 3-1, 3-2, and 3-3 by the Friedel-Crafts alkylation reaction of alkyl halide compounds and arene compounds using organic phosphine compounds as a catalyst.