Patents Assigned to JTEC Corporation
  • Patent number: 10696951
    Abstract: Provided is a method for efficiently culturing pluripotent stem cells with higher safety. The present invention relates to a method for culturing pluripotent stem cells, the method comprising culturing an isolated pluripotent stem cells in a pseudo-microgravity environment to proliferate the pluripotent stem cells while maintaining the pluripotent stem cells in an undifferentiated state, thereby forming and growing spheroids of the pluripotent stem cells; and a method for inducing differentiation of pluripotent stem cells by using the method.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: June 30, 2020
    Assignee: JTEC Corporation
    Inventors: Toshimasa Uemura, Yui Onomura, Takashi Tsumura
  • Patent number: 10597621
    Abstract: Disclosed is a rotating culture vessel based on a rotating culture technology using an RWV, by which cell seeding, liquid medium exchange, quality control and so on can be automated and degassing can be conducted simultaneously with liquid medium exchange without disturbing the cells under culture. Also disclosed is an automatic cell culture apparatus using the same. A rotating culture vessel, which contains cells and a liquid culture medium, to be attached to a horizontal rotating shaft of a rotating culture device to three-dimensionally culture the cells, wherein one or more inlets/outlets for supplying cells and a liquid culture medium at the early stage and then taking out the cultured cells, are formed at appropriate position of a flat cylindrical culture container; at least one pair of a supply port and a discharge port for liquid medium exchange is provided on the outer circumferential cylindrical face of the culture container.
    Type: Grant
    Filed: March 26, 2019
    Date of Patent: March 24, 2020
    Assignee: JTEC CORPORATION
    Inventors: Takashi Tsumura, Hiromi Okada, Toshimasa Uemura, Yoshimi Oyabu
  • Publication number: 20190225924
    Abstract: Disclosed is a rotating culture vessel based on a rotating culture technology using an RWV, by which cell seeding, liquid medium exchange, quality control and so on can be automated and degassing can be conducted simultaneously with liquid medium exchange without disturbing the cells under culture. Also disclosed is an automatic cell culture apparatus using the same. A rotating culture vessel, which contains cells and a liquid culture medium, to be attached to a horizontal rotating shaft of a rotating culture device to three-dimensionally culture the cells, wherein one or more inlets/outlets for supplying cells and a liquid culture medium at the early stage and then taking out the cultured cells, are formed at appropriate position of a flat cylindrical culture container; at least one pair of a supply port and a discharge port for liquid medium exchange is provided on the outer circumferential cylindrical face of the culture container.
    Type: Application
    Filed: March 26, 2019
    Publication date: July 25, 2019
    Applicant: JTEC CORPORATION
    Inventors: Takashi TSUMURA, Hiromi OKADA, Toshimasa UEMURA, Yoshimi OYABU
  • Patent number: 10287539
    Abstract: Disclosed is a rotating culture vessel based on a rotating culture technology using an RWV, by which cell seeding, liquid medium exchange, quality control and so on can be automated and degassing can be conducted simultaneously with liquid medium exchange without disturbing the cells under culture. Also disclosed is an automatic cell culture apparatus using the same. A rotating culture vessel, which contains cells and a liquid culture medium, to be attached to a horizontal rotating shaft of a rotating culture device to three-dimensionally culture the cells, wherein one or more inlets/outlets for supplying cells and a liquid culture medium at the early stage and then taking out the cultured cells, are formed at appropriate position of a flat cylindrical culture container; at least one pair of a supply port and a discharge port for liquid medium exchange is provided on the outer circumferential cylindrical face of the culture container.
    Type: Grant
    Filed: June 9, 2010
    Date of Patent: May 14, 2019
    Assignee: JTEC CORPORATION
    Inventors: Takashi Tsumura, Hiromi Okada, Toshimasa Uemura, Yoshimi Oyabu
  • Publication number: 20190119623
    Abstract: This large-scale cell culture system is for performing large-scale culture of cells by performing, in a closed system, subculture and transfer of spheroids and a culture medium by use of a vessel having a syringe structure, wherein the vessel comprises a front flange and a back flange which have a same circular outer shape and which are provided integrally with both ends of an outer cylinder part of the vessel, and the vessel allows rotary culture, utilizing the front flange and the back flange in a state where a head of the vessel is closed by a detachable cap and a space, in the vessel, closed by a gasket of a plunger is filled with a cell liquid obtained by suspending cells in a culture medium.
    Type: Application
    Filed: January 25, 2017
    Publication date: April 25, 2019
    Applicant: JTEC CORPORATION
    Inventors: Takashi TSUMURA, Toshimasa UEMURA, Yudai UCHITA
  • Publication number: 20190010436
    Abstract: The rotating culture device includes a tubular culture vessel long in an axial direction, a support mechanism which supports the culture vessel so that the culture vessel is rotatable about an axis thereof, rotation drive section which rotationally drives the culture vessel, tilting section which tilts the support mechanism so that the axis of the culture vessel is tilted in a vertical direction, and control section which controls operation of the rotation drive section and operation of the tilting section.
    Type: Application
    Filed: January 10, 2017
    Publication date: January 10, 2019
    Applicant: JTEC Corporation
    Inventors: Takashi TSUMURA, Takahiro ONO
  • Publication number: 20170218343
    Abstract: Provided is a method for efficiently culturing pluripotent stem cells with higher safety. The present invention relates to a method for culturing pluripotent stem cells, the method comprising culturing an isolated pluripotent stem cells in a pseudo-microgravity environment to proliferate the pluripotent stem cells while maintaining the pluripotent stem cells in an undifferentiated state, thereby forming and growing spheroids of the pluripotent stem cells; and a method for inducing differentiation of pluripotent stem cells by using the method.
    Type: Application
    Filed: September 30, 2015
    Publication date: August 3, 2017
    Applicant: JTEC Corporation
    Inventors: Toshimasa Uemura, Yui Onomura, Takashi Tsumura
  • Patent number: 9287016
    Abstract: The device is configured from: a reflective surface shape controllable mirror in which a band-shaped X-ray reflective surface 2 is formed on a central portion of a front surface of a substrate 1, reference planes 3 are formed along both sides of the X-ray reflective surface, and a plurality of piezoelectric elements 4 are attached to at least one of front and back surfaces of the substrate so as to be arranged in the longitudinal direction of the X-ray reflective surface on both side portions of the substrate, and a multichannel control system for applying a voltage to each of the piezoelectric elements.
    Type: Grant
    Filed: December 28, 2010
    Date of Patent: March 15, 2016
    Assignees: JTEC CORPORATION, OSAKA UNIVERSITY
    Inventors: Kazuto Yamauchi, Takashi Kimura, Takashi Tsumura
  • Patent number: 9212344
    Abstract: Provided is a small-scale cell culture apparatus having a culture medium replacement function for culturing cells in a small number of Petri dishes, the cell culture apparatus being capable of performing automatic replacement of the culture medium and cell culture within the same cavity and significantly reducing the apparatus cost. At least one set of upper and lower discs is arranged inside an incubator chamber 1. Petri dishes 4, 6 in each of which cells and a culture medium are put are held on lower discs 18, 19, and top lids 5, 7 are held on upper discs 19, 30. The lower side of each of the top lids is open.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: December 15, 2015
    Assignee: JTEC CORPORATION
    Inventors: Takashi Tsumura, Takahiro Ono
  • Publication number: 20150010996
    Abstract: Provided is a small-scale cell culture apparatus having a culture medium replacement function for culturing cells in a small number of Petri dishes, the cell culture apparatus being capable of performing automatic replacement of the culture medium and cell culture within the same cavity and significantly reducing the apparatus cost. At least one set of upper and lower discs is arranged inside an incubator chamber 1. Petri dishes 4, 6 in each of which cells and a culture medium are put are held on lower discs 18, 19, and top lids 5, 7 are held on upper discs 19, 30. The lower side of each of the top lids is open.
    Type: Application
    Filed: February 28, 2013
    Publication date: January 8, 2015
    Applicant: JTEC Corporation
    Inventors: Takashi Tsumura, Takahiro Ono
  • Patent number: 8744046
    Abstract: Provided are a method and an apparatus of precisely measuring the intensity profile of an x-ray nanobeam, which can measure x-rays having different wavelengths with one knife edge and can perform optimal measurements corresponding to the depth of focus of an x-ray beam and the conditions of other measurement devices, using a dark field measurement method which enables precise measurements of the profile of an x-ray beam using a knife edge and using diffracted and transmitted x-rays. The knife edge (4) is formed of a heavy metal which advances the phase of an x-ray passing therethrough and is fabricated in such a manner that the thickness may change in the longitudinal direction continuously or in a stepwise fashion.
    Type: Grant
    Filed: March 19, 2009
    Date of Patent: June 3, 2014
    Assignees: JTEC Corporation, Osaka University
    Inventors: Kazuto Yamauchi, Hidekazu Mimura, Hiromi Okada
  • Patent number: 8235769
    Abstract: To provide an electron beam assisted EEM method that can realize ultraprecision machining of workpieces, including glass ceramic materials, in which at least two component materials different from each other in machining speed in a machining process are present in a refined mixed state and the surface state is not even, to a surface roughness of 0.2 to 0.05 nm RMS. The EEM method comprises a working process in which a workpiece and chemically reactive fine particles are allowed to flow along the working face to remove atoms on the working face chemically bonded to the fine particles together with the fine particles through chemical interaction between the fine particles and the working face interface. The workpiece comprises at least two component materials present in a refined mixed state and different from each other in machining speed in the machining process.
    Type: Grant
    Filed: August 3, 2006
    Date of Patent: August 7, 2012
    Assignees: JTEC Corporation
    Inventor: Yuzo Mori
  • Patent number: 8000443
    Abstract: A high precision posture control method for sustaining the posture of an X-ray optical element constantly at 1 ?rad or less. A longitudinal condensation mirror and a lateral condensation mirror, each having a condensation plane band consisting of an elliptical reflective surface, are arranged perpendicularly to each other to form a K-B mirror arrangement. Fresnel mirrors are respectively constituted of a pair of planar reflective surfaces formed in the vicinities of the incident side end and the exit side end of the condensation plane band of each condensation mirror. Interference fringe by the Fresnel mirror of each condensation mirror is independently monitored at a position insusceptible to a condensation beam by the condensation plane band, and variation in interference fringe is detected electrically and its detection signal is used as a feedback signal for posture control of each condensation mirror.
    Type: Grant
    Filed: July 17, 2007
    Date of Patent: August 16, 2011
    Assignees: JTEC Corporation, Osaka University
    Inventors: Kazuto Yamauchi, Hidekazu Mimura, Hiromi Okada
  • Patent number: 7936860
    Abstract: An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.
    Type: Grant
    Filed: December 27, 2007
    Date of Patent: May 3, 2011
    Assignees: JTEC Corporation, Osaka University
    Inventors: Kazuto Yamauchi, Hidekazu Mimura, Hiromi Okada
  • Publication number: 20100183122
    Abstract: An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.
    Type: Application
    Filed: December 27, 2007
    Publication date: July 22, 2010
    Applicants: Jtec Corporation, Osaka University
    Inventors: Kazuto Yamauchi, Hidekazu Mimura, Hiromi Okada
  • Patent number: 7616324
    Abstract: To provide a method for measuring a plane mirror or a curved surface mirror close to plane mirror for condensing hard X-rays or soft X-rays used in a radiation light facility, especially an elliptical or tubular object having a steep profile exceeding 1×10?4 rad, ultra precisely with a precision on nano order or sub-nano order. Overall profile is measured by using overall profile data obtained from a Fizeau interferometer and stitching a plurality of micromeasurement data from a Michelson microinterferometer.
    Type: Grant
    Filed: February 15, 2007
    Date of Patent: November 10, 2009
    Assignees: JTEC Corporation
    Inventors: Kazuto Yamauchi, Hidekazu Mimura