Abstract: A plasma processing method includes driving electric current through a Z-pinch plasma column within an atmospheric isolation device to produce a Lorentz force on the Z-pinch plasma column. Radiofrequency (RF) energy is supplied to the Z-Pinch plasma column with one or more RF generators. One or more RF applicators direct RF energy from the one or more RF generators toward the Z-pinch plasma column in a direction generally perpendicular to the direction of the electric current through the Z-pinch plasma column. One or more RF distributors distribute the RF energy to the one or more RF applicators.

Abstract: A plasma processing method includes driving electric current through a Z-pinch plasma column within an atmospheric isolation device to produce a Lorentz force on the Z-pinch plasma column and supplying radiofrequency (RF) energy to the Z-Pinch plasma column with one or more RF generators configured to drive energy into regions of the Z-pinch plasma. One or more RF applicators direct RF energy from the one or more RF generators toward the Z-pinch plasma column in a direction generally perpendicular to the direction of the electric current through the Z-pinch plasma column and one or more RF distributors distribute the RF energy to the one or more RF applicators.