Patents Assigned to JX Nippon Mining & Metal Corproation
  • Cobalt Sputtering Target
    Publication number: 20170236696
    Abstract: A Co sputtering target having a purity of 99.99% to 99.999% and a Si content of 1 wtppm or less. Provided is a Co sputtering target capable of improving barrier properties and adhesiveness by suppressing conversion into highly reactive silicide by a reduction in the Si content in cobalt.
    Type: Application
    Filed: September 25, 2015
    Publication date: August 17, 2017
    Applicant: JX Nippon Mining & Metal Corproation
    Inventors: Kunihiro Oda, Takayuki Asano