Patents Assigned to K-Technologies, Inc.
  • Patent number: 12123072
    Abstract: In alternative embodiments, provided are methods and processes for the removal of cadmium (Cd) from wet-process phosphoric acid that may contain Cd, including excessive amounts of Cd. The process developed is based on the application of commercially available ion exchange resins with the application of Continuous Ion Exchange (CIX) technology. In alternative embodiments, provided are processes and methods for the recovery and/or the removal of cadmium from wet-process phosphoric acid using a continuous ion exchange approach. In alternative embodiments, use of processes and methods as provided herein allows for the reduction of cadmium metal contaminants with minimal phosphate losses and dilution in order to produce a phosphoric acid that is suitable for the production of fertilizers and phosphoric acid products, such as world-class diammonium phosphate fertilizer (DAP), merchant-grade phosphoric acid, super-phosphoric acid, and other phosphoric acid products.
    Type: Grant
    Filed: November 1, 2023
    Date of Patent: October 22, 2024
    Assignee: K-Technologies, Inc.
    Inventors: William W. Berry, Thomas E. Baroody
  • Patent number: 11840745
    Abstract: In alternative embodiments, provided are methods and processes for the removal of cadmium (Cd) from wet-process phosphoric acid that may contain Cd, including excessive amounts of Cd. The process developed is based on the application of commercially available ion exchange resins with the application of Continuous Ion Exchange (CIX) technology. In alternative embodiments, provided are processes and methods for the recovery and/or the removal of cadmium from wet-process phosphoric acid using a continuous ion exchange approach. In alternative embodiments, use of processes and methods as provided herein allows for the reduction of cadmium metal contaminants with minimal phosphate losses and dilution in order to produce a phosphoric acid that is suitable for the production of fertilizers and phosphoric acid products, such as world-class diammonium phosphate fertilizer (DAP), merchant-grade phosphoric acid, super-phosphoric acid, and other phosphoric acid products.
    Type: Grant
    Filed: October 25, 2022
    Date of Patent: December 12, 2023
    Assignee: K-Technologies, Inc.
    Inventors: William W. Berry, Thomas E. Baroody
  • Patent number: 11512367
    Abstract: In alternative embodiments, provided are methods and processes for the removal of cadmium (Cd) from wet-process phosphoric acid that may contain Cd, including excessive amounts of Cd. The process developed is based on the application of commercially available ion exchange resins with the application of Continuous Ion Exchange (CIX) technology. In alternative embodiments, provided are processes and methods for the recovery and/or the removal of cadmium from wet-process phosphoric acid using a continuous ion exchange approach. In alternative embodiments, use of processes and methods as provided herein allows for the reduction of cadmium metal contaminants with minimal phosphate losses and dilution in order to produce a phosphoric acid that is suitable for the production of fertilizers and phosphoric acid products, such as world-class diammonium phosphate fertilizer (DAP), merchant-grade phosphoric acid, super-phosphoric acid, and other phosphoric acid products.
    Type: Grant
    Filed: June 3, 2020
    Date of Patent: November 29, 2022
    Assignee: K-Technologies, Inc.
    Inventors: William W. Berry, Thomas E. Baroody
  • Publication number: 20190078176
    Abstract: In alternative embodiments, the invention provides processes and methods for the recovery, removal or extracting of, and subsequent purification of uranium from a wet-process phosphoric acid using a continuous ion exchange processing approach, where the uranium is recovered from a phosphoric acid, or a phos-acid feedstock using either a dual or a single stage extraction methodology. In both cases an intermediate ammonium uranyl-tricarbonate solution is formed. In alternative embodiments, in the dual cycle approach, this solution is contacted in a second continuous ion exchange system with a strong anion exchange resin then subsequently recovered as an acidic uranyl solution that is further treated to produce an intermediate uranyl peroxide compound which is ultimately calcined to produce the final uranium oxide product.
    Type: Application
    Filed: August 13, 2018
    Publication date: March 14, 2019
    Applicants: K-Technologies, Inc., OCP S.A.
    Inventors: William W. Berry, Thomas E. Baroody, Driss Dhiba, Mounir El Mahdi
  • Publication number: 20190024749
    Abstract: A horizontal-motion vibration isolator utilizes a plurality of bent flexures to support an object to be isolated from horizontal motion. Each bent flexure includes a fixed end coupled to a base and a floating end which is cantilevered and coupled to the object being isolated. The arrangement of bent flexures allows the vertical height of the isolator to be reduced without compromising vibration isolation performance. Compressed springs or spring-like elements can be added to bear some of the weight of the object being isolated thus increasing the payload capacity of the isolator.
    Type: Application
    Filed: September 25, 2018
    Publication date: January 24, 2019
    Applicant: Minus K. Technology, Inc.
    Inventor: Erik Runge
  • Patent number: 10060011
    Abstract: In alternative embodiments, the invention provides processes and methods for the recovery, removal or extracting of, and subsequent purification of uranium from a wet-process phosphoric acid using a continuous ion exchange processing approach, where the uranium is recovered from a phosphoric acid, or a phos-acid feedstock using either a dual or a single stage extraction methodology. In both cases an intermediate ammonium uranyl-tricarbonate solution is formed. In alternative embodiments, in the dual cycle approach, this solution is contacted in a second continuous ion exchange system with a strong anion exchange resin then subsequently recovered as an acidic uranyl solution that is further treated to produce an intermediate uranyl peroxide compound which is ultimately calcined to produce the final uranium oxide product.
    Type: Grant
    Filed: June 2, 2017
    Date of Patent: August 28, 2018
    Assignees: K-Technologies, Inc., OCP S.A.
    Inventors: William W Berry, Thomas E. Baroody, Driss Dhiba, Mounir El Mahdi
  • Publication number: 20170335430
    Abstract: In alternative embodiments, the invention provides processes and methods for the recovery, removal or extracting of, and subsequent purification of uranium from a wet-process phosphoric acid using a continuous ion exchange processing approach, where the uranium is recovered from a phosphoric acid, or a phos-acid feedstock using either a dual or a single stage extraction methodology. In both cases an intermediate ammonium uranyl-tricarbonate solution is formed. In alternative embodiments, in the dual cycle approach, this solution is contacted in a second continuous ion exchange system with a strong anion exchange resin then subsequently recovered as an acidic uranyl solution that is further treated to produce an intermediate uranyl peroxide compound which is ultimately calcined to produce the final uranium oxide product.
    Type: Application
    Filed: June 2, 2017
    Publication date: November 23, 2017
    Applicants: K-Technologies, Inc., OCP S.A.
    Inventors: William W. Berry, Thomas E. Baroody, Driss Dhiba, Mounir El Mahdi
  • Patent number: 9702026
    Abstract: In alternative embodiments, the invention provides processes and methods for the recovery, removal or extracting of, and subsequent purification of uranium from a wet-process phosphoric acid using a continuous ion exchange processing approach, where the uranium is recovered from a phosphoric acid, or a phos-acid feedstock using either a dual or a single stage extraction methodology. In both cases an intermediate ammonium uranyl-tricarbonate solution is formed. In alternative embodiments, in the dual cycle approach, this solution is contacted in a second continuous ion exchange system with a strong anion exchange resin then subsequently recovered as an acidic uranyl solution that is further treated to produce an intermediate uranyl peroxide compound which is ultimately calcined to produce the final uranium oxide product.
    Type: Grant
    Filed: July 21, 2013
    Date of Patent: July 11, 2017
    Assignees: K-Technologies, Inc., OCP S.A.
    Inventors: William W Berry, Thomas E. Baroody, Driss Dhiba, Mounir El Mahdi
  • Patent number: 9663375
    Abstract: In particular, in alternative embodiments, the invention provides for a method to recover silicofluoride and phosphate species from wastewaters, or barometric condenser waters, that are typically utilized in wet-process phosphoric acid facilities. The species are recovered via a continuous ion exchange approach that allows for economic recovery of the materials and especially with the silicofluoride component allows for the production of valuable industrial materials such as hydrofluoric acid and other fluoride salts as well as industrial-grade precipitated silica materials. Return of the treated waste water to the phos-acid plant allows for optimization of reagent usage.
    Type: Grant
    Filed: July 21, 2013
    Date of Patent: May 30, 2017
    Assignee: K-Technologies, Inc.
    Inventors: William W. Berry, Thomas E. Baroody
  • Patent number: 9513112
    Abstract: A collimated laser beam is directed towards the wafer bottom such that the impinging light is partially forward deflected along the vias' bottom edges. Concentric laser interference fringes occur on the wafer top from constructive and destructive interference between the forward deflected and directly through propagating laser. A top down optical image from a number of vias' top openings and a top down fringe image from the same vias' concentric fringe sets are processed to three dimensionally characterize the vias.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: December 6, 2016
    Assignee: n&k Technology, Inc.
    Inventors: Christopher Rush, John C. Lam
  • Patent number: 8269401
    Abstract: A graphene power-mill system is provided, including a graphene sheet configured for generating electrical charges on both sides, a graphene sheet holder configured for engaging and holding the graphene sheet on a first side, a groove provided on the first side of the graphene sheet holder, and a graphene pusher or bender configured for pushing and releasing a portion of the graphene sheet into the groove. the graphene pusher or bender has a shape fitting the groove, and the graphene sheet recovers to be flat after removing the graphene pusher or bender from the groove. The graphene sheet can comprise graphene layers and one or more polyvinylidene fluoride (PVDF) layers stacked alternatingly. Both sides of the stacked graphene layers can be connected in parallel electrically.
    Type: Grant
    Filed: November 28, 2011
    Date of Patent: September 18, 2012
    Assignee: K-Technology, Inc.
    Inventors: Ki Il Kim, Sang Woo Kim, Young Kim
  • Patent number: 8132773
    Abstract: A passive thermally responsive element (TRE) is used to eliminate or substantially reduce the sensitivity of the axial (vertical) position and axial (vertical) natural frequency of a negative-stiffness vibration isolator to changes in temperature. The TRE will compensate for the inherent thermal sensitivity of the isolator without this added element. The TRE can be a thermally responsive spring that produces forces in response to temperature changes to keep the isolator at or near its ideal equilibrium operating position in order to control the equilibrium position and also to maintain the low natural frequency characteristic of the negative-stiffness vibration isolator.
    Type: Grant
    Filed: October 13, 2010
    Date of Patent: March 13, 2012
    Assignee: Minus K. Technology, Inc.
    Inventor: David L. Platus
  • Patent number: 8125641
    Abstract: A method and apparatus for convolving spectroscopic data with certain phase information for practicing phase-compensated sensitivity-enhanced spectroscopy (PCSES). PCSES uses a beam of radiation in a polarization state PSp from a source emitting at a plurality of wavelengths, and places in the beam a compensator capable of altering polarization state PSp by applying a delimited phase shift ? between two orthogonal polarization axes of the radiation to restrict a finely-vibrating spectrum. A sample disposed in the beam after the compensator generates a response beam by reflection, transmission or even both. A polarization state PSa of the response beam is passed to a detector to determine a spectrum of the response beam. A first spectrum is collected when polarization states PSp, PSa and the compensator are in a first polarization-altering configuration and a second spectrum is collected when polarization states PSp, PSa and the compensator are in a second polarization-altering configuration.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: February 28, 2012
    Assignee: n&k Technology, Inc.
    Inventor: Guoguang Li
  • Patent number: 7999936
    Abstract: The refractive index, extinction coefficient, size and density of fluid suspended particles are simultaneously determined by combined transmittance and scattering measurements. The scattering measurements are preferably angle selective to obtain additional information about the scattered light. A charge-coupled device is employed for its high sensitivity to low light intensity in measurement of scattered light in combination with a photodiode array employed for its high signal to noise ratio, which is beneficial in transmittance measurement. The scattered light may be measured in an angle selective fashion by use of a motorized aperture that is concentrically positioned with respect to the impinging beam axis and moveable along the impinging beam axis. An ellipsoidal mirror collects the scattered light that passes through the motorized aperture and focuses the scattered light towards the charge-coupled device.
    Type: Grant
    Filed: April 2, 2009
    Date of Patent: August 16, 2011
    Assignee: n&k Technology, Inc.
    Inventors: Guoguang Li, Abdul Rahim Forouhi, Erik Nackerud
  • Patent number: 7962242
    Abstract: A spatial photomask flipper provides up to four access gates for an unloading of a clamped photomask after its reorientation along a single photomask transfer axis. The clamping frames holding the photomask are secured by a locking control cam that prevents their inadvertent opening in any other but the two main flip orientations. The flipper is part of an automated system including a digital camera and an image recognition algorithm that interpret an arbitrary initial photomask loading orientation from a circumferential photomask identification number. An eventual pellicle on the photomask may be also automatically detected via a pellicle detection sensor. Alternately, the digital camera may be employed for pellicle detection together with a pellicle detection algorithm that processes the digital image for well known components of the pellicle such as the pellicle frame.
    Type: Grant
    Filed: March 18, 2008
    Date of Patent: June 14, 2011
    Assignee: n&k Technology Inc.
    Inventors: Marc T. Aho, Thaddeus J. Wilson, Jeff Roberts
  • Patent number: 7756677
    Abstract: Improved optical characterization is provided by organizing the optical modeling calculations such that incident radiation parameters (e.g., wavelength) are varied in the outermost loop of any modeling run. By completing calculations for all combinations of structure parameters at one wavelength before moving to the next wavelength, calculation efficiency can be greatly improved. In particular, with this approach it is not necessary to cache (or re-compute) intermediate results pertaining to different wavelengths, in contrast to conventional approaches. Further improvements in efficiency can be obtained by organizing reflectance calculations such that for any layer Ll, stored intermediate results pertaining to layers below Ll can be used to calculate optical response as parameters for Ll and layers above Ll are varied.
    Type: Grant
    Filed: August 28, 2007
    Date of Patent: July 13, 2010
    Assignee: n&k Technology, Inc.
    Inventor: Guoguang Li
  • Patent number: 7755775
    Abstract: Apparatus and method for examining a sample with a broadband radiation while preserving a small spot and low wave front distortion. The apparatus has a broadband source for generating the broadband radiation and a first reflective optics that employ toroidal mirrors that are barrel or donut-shaped and may be placed in a crossed or parallel arrangement for producing a broadband test beam that is guided to the sample such that it is incident on it at a small spot. A sampling aperture is provided for filtering a certain center portion from the broadband test beam. A second reflective optics is provided for shaping a reflected response beam from the broadband radiation that is reflected from the spot. The response beam is delivered by second reflective optics to a detector for examination. The apparatus and method can be applied to improve wave front distortion in reflectance measurements and for performing transmittance measurements with chromatic distortion compensation.
    Type: Grant
    Filed: October 3, 2006
    Date of Patent: July 13, 2010
    Assignee: n&k Technology, Inc.
    Inventor: Guoguang Li
  • Patent number: 7717661
    Abstract: A compact multiple diameter wafer testing device with a footprint of about 33 by 34 inches features on-chuck wafer calibration and integrated cassette-chuck transfer. It includes a five axes wafer handling system, a quick exchange chuck and a fixed through beam sensor fixed. Two of the five axes are provided by an X-Y stage, a third axis is provided by a rotary stage on top of the X-Y stage, a fourth axis belongs to a rotating effector and a fifth axis is provided by motion controlled pin lifters all combined with the X-Y stage. The quick exchange chuck may be easily changed for different wafer diameters and also calibrated by the through beam sensor. The through beam sensor provides on-chuck position calibration of the chucked wafers in conjunction with the X-Y stage and rotary stage. The compact wafer testing device handles wafers between six and twelve inches diameter.
    Type: Grant
    Filed: May 25, 2006
    Date of Patent: May 18, 2010
    Assignee: n&k Technology, Inc.
    Inventors: Marc T. Aho, Thaddeus J. Wilson
  • Patent number: 7679736
    Abstract: A pellicle correction factor is determined by comparing a first measurement of a reference photomask alone with a second measurement of that reference photomask through a reference pellicle protecting the mask layers of the photomask. A number of pellicle correction factors may be determined for different type pellicles and made accessible in pellicle correction factor lookup table of the system or supplied on a separate data storage medium. Raw Reflectance and/or Transmittance measurement data of a generic photomask through a generic pellicle is consecutively corrected for the measurement distorting effects of that pellicle by applying a matching one of the previously determined pellicle correction factors. The pellicle correction factor is preferably an attenuation signature across a predetermined measurement irradiation spectrum.
    Type: Grant
    Filed: July 26, 2008
    Date of Patent: March 16, 2010
    Assignee: n&k Technology, Inc.
    Inventors: Marc T. Aho, Thaddeus J. Wilson, Jeff Roberts
  • Patent number: 7616301
    Abstract: A vacuum assisted disc clamping device provides a number of fixture rings preferably concentrically stacked on a fixture body that is moveable in fixture ring stacking direction and actuated by a wedge drive to compensate for varying fixture levels associated with the individual fixture rings and disc standards. Each fixture ring includes a planar flange with a vacuum groove and a central conical portion that rises above the planar flange. The conical portion is defined with a diameter and cone angle such that a disc of corresponding dimensional standard may be readily placed on the fitting fixture ring with the disc bottom being sucked onto the planar flange while the disc hole centers on the conical portion.
    Type: Grant
    Filed: March 3, 2004
    Date of Patent: November 10, 2009
    Assignee: n&k Technology, Inc.
    Inventors: Marc Aho, Daniel Tran