Patents Assigned to Kabushiki Kaisha Ekisho Sentan Gijutsu Kihatsu Center
  • Method of exposure and attenuated type phase shift mask
    Patent number: 7579122
    Abstract: A method of exposing a surface to be exposed and an attenuated type phase shift mask for use in the method are provided herein. The attenuated type phase shift mask has a reference area allowing a light radiated from a light source to pass through and an amplitude and phase modulation area allowing a part of said light to pass through. The phase modulation amount of the amplitude and phase modulation area relative to the reference area of the attenuated type phase shift mask is {360°×n+(182° to 203°)} (n is an integer).
    Type: Grant
    Filed: April 5, 2006
    Date of Patent: August 25, 2009
    Assignee: Kabushiki Kaisha Ekisho Sentan Gijutsu Kihatsu Center
    Inventor: Yukio Taniguchi