Abstract: Disclosed is an exposure method and apparatus (aligner) for exposure wherein there is reduced a physical load put on a driving mechanism which moves a supporting device for supporting a mask and an exposure object which has a photosensitive material, and the structure of the driving mechanism is simplified.

Abstract: A thin film transistor capable of controlling the dispersion in its characteristic, which includes a glass base plate 2, an insulating foundation film 3 made of silicon dioxide (SiO2) and formed on the glass base plate 2, a semiconductor layer 4 made of silicon (Si) formed on the insulating foundation film 3, a source region 8 and a drain region 9 which are formed on the semiconductor layer 4 to be separately located on both sides in the longitudinal direction of the semiconductor layer, a channel region 10 existing between the source region 8 and drain region 9, a gate insulating film 6 made of SiO2 and formed on the channel region 10, and a gate electrode 7 formed on the gate insulating film 6, wherein the taper angle &thgr; of the end portion 5 located in the width direction WD of the channel region 10 covered by at least the gate electrode 7 is 60° or more.

Abstract: In a second exposure following a first exposure, a light transmitting-screening pattern of a second original mask is exposed on a hologram material by using a second object light to be irradiated on a hologram material though the second original mask and a second reference light to be irradiated on a hologram material to be irradiated on the hologram material not through the second original mask, and by changing a second phase difference between the second object light and the second reference light in a position in an optical path from a light source to the hologram material so that a first phase difference between the first object light and the first reference light may differ from the second phase difference.