Abstract: The present invention has as an object thereof to provide a cleaning method which realizes, in the cleaning process, (1) a reduction in the number of processes, (2) a simplification of the cleaning apparatus, and (3) a reduction in the amount of chemicals and pure water employed, and which has highly superior cleaning effects and does not damage the substrate body, as well as to provide a rinsing method which aids in the hydrogen termination of silicon atoms.
Type:
Grant
Filed:
November 29, 1999
Date of Patent:
July 9, 2002
Assignees:
Kabushiki Kaisha Ultraclean Technology Reserach
Institute