Patents Assigned to Kabushiki Kaisha Yoshiba
  • Patent number: 9632407
    Abstract: According to an embodiment, a mask processing apparatus is provided. The mask processing apparatus includes a stage, a laser light source and a rotary mechanism. The stage is configured to hold a mask formed with a pattern to be transferred to a transfer target substrate. The laser light source is configured to output laser light that is radiated into the mask and thereby alters the mask. The rotary mechanism is configured to rotate the stage in an in-plane direction of a pattern formation surface of the mask.
    Type: Grant
    Filed: September 11, 2014
    Date of Patent: April 25, 2017
    Assignee: Kabushiki Kaisha Yoshiba
    Inventors: Hidenori Sato, Manabu Takakuwa, Nobuhiro Komine, Taketo Kuriyama