Patents Assigned to Kanegafuchi Chemical Industry Co. Ltd.
  • Patent number: 6576733
    Abstract: This invention provides a curable composition capable of giving cured products drastically improved in resilience. This composition includes (A) an oxypropylene polymer having at least one silicon atom-containing group with a hydroxyl group or a hydrolyzable group bound to the silicon atom and having an Mw/Mn ratio of not more than 1.6 and a number average molecular weight of not less than 6,000, (B) an organic carboxylic acid salt of divalent tin and (C) an organic amine compound.
    Type: Grant
    Filed: March 20, 1997
    Date of Patent: June 10, 2003
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Masayuki Fujita, Michihide Homma, Hiroshi Wakabayashi
  • Patent number: 6369187
    Abstract: This invention provides a novel reactive silicon group-containing oxypropylene polymer and a method of producing the same. The reactive silicon group-containing oxypropylene polymer of the invention is an oxypropylene polymer the main polymer chain of which is essentially composed of a repeating unit of the formula and which has at least one reactive silicon group and at least one urethane bond each terminal to the chain, an {overscore (M)}w/{overscore (M)}n ratio of not more than 1.5 and a number average molecular weight of not less than 3,000. The production method of the invention is characterized by reacting an oxypropylene polymer having an {overscore (M)}w/{overscore (M)}n ratio of not more than 1.5 and a number average molecular weight per terminal functional group of not less than 1,500 with a compound having a reactive silicon group and an isocyanato group.
    Type: Grant
    Filed: May 15, 1996
    Date of Patent: April 9, 2002
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Masayuki Fujita, Michihide Homma, Hiroshi Wakabayashi
  • Patent number: 6300404
    Abstract: A curable polymer composition comprising (a) an oxyalkylene polymer having a silicon-containing group which has a hydroxyl or hydrolyzable group bonded to the silicon atom and can be crosslinked through a silanol condensation reaction, and (b) a paraffinic hydrocarbon, which composition provides a cured material having improved tack which remains on the surface of the cured material.
    Type: Grant
    Filed: December 23, 1998
    Date of Patent: October 9, 2001
    Assignee: Kanegafuchi Chemical Industry Co. Ltd.
    Inventors: Keiko Nishimura, Masaaki Azuma, Kazumasa Hashimoto, Fumio Kawakubo
  • Patent number: 6157072
    Abstract: The invention relates to an image sensor for use in the facsimile device, image reader, digital scanner and the like. In this image sensor, the photodiodes and blocking diodes formed on an insulating board are insulated by a transparent interlayer insulating film and are connected in series and opposite polarity by coupling electrodes through contact holes in the transparent interlayer insulating film. This image sensor features a high reading speed and a low dark output noise.
    Type: Grant
    Filed: April 8, 1997
    Date of Patent: December 5, 2000
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Takehisa Nakayama, Tadashi Obayashi, Yoichi Hosokawa, Kenji Kobayashi, Satoru Murakami, Tomoyoshi Zenki
  • Patent number: 5969037
    Abstract: A room temperature curing composition of this invention comprises an emulsion obtained by multi-stage emulsion polymerization of monomers, the emulsion comprising emulsion particles, a core of which comprises (A) 1 to 30% by weight of silyl group-containing vinyl monomer, (B) 70 to 99% by weight of vinyl monomer copolymerizable with component (A), the outermost shell of which comprises (A) 0.1 to 30% by weight of silyl group-containing vinyl monomer and (B) 40 to 99.4% by weight of vinyl monomer copolymerizable with component (A), and (D) 0.5 to 30% by weight of hydrophilic vinyl monomer. The room temperature curing composition of this invention has a stable silyl group, and a much improved film-forming ability after long-term storage and it also shows excellent mechanical stability, water-resistance, durability and white enamel gloss.
    Type: Grant
    Filed: February 25, 1998
    Date of Patent: October 19, 1999
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Takanori Hatano, Naotami Ando
  • Patent number: 5902736
    Abstract: In a process for the production of a D-.alpha.-amino acid, in which an N-carbamyl-D-.alpha.-amino acid corresponding to the general formula: ##STR1## wherein R represents phenyl, hydroxy-substituted phenyl, substituted or unsubstituted alkyl, or thienyl, is converted by a microbial enzyme in an aqueous medium to a D-.alpha.-amino acid corresponding to the general formula: ##STR2## wherein R is the same as defined above, decarbamylase produced by a microorganism of the genus Comamonas, Blastobacter, Alcaligenes, Sporosarcina, Rhizobium, Bradyrhizobium or Arthrobacter is used as the enzyme converting the N-carbamyl-D-.alpha.-amino acid to the D-.alpha.-amino acid.The conversion of the N-carbamyl-D-.alpha.-amino acids to the D-.alpha.-amino acids is carried out in a neutral to alkaline pH range.
    Type: Grant
    Filed: June 6, 1994
    Date of Patent: May 11, 1999
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Hideaki Yamada, Sakayu Shimizu, Yasuhiro Ikenaka, Kazuyoshi Yajima, Yukio Yamada, Hirokazu Nanba, Masayuki Takano, Satomi Takahashi
  • Patent number: 5863785
    Abstract: In a process for the production of a D-.alpha.-amino acid, in which an N-carbamyl-D-.alpha.-amino acid corresponding to the general formula: ##STR1## wherein R represents phenyl, hydroxy-substituted phenyl, substituted or unsubstituted alkyl, or thienyl, is converted by a microbial enzyme in an aqueous medium to a D-.alpha.-amino acid corresponding to the general formula: ##STR2## wherein R is the same as defined above, decarbamylase produced by a microorganism of the genus Comamonas, Blastobacter, Alcaligenes, Sporosarcina, Rhizobium, Bradyrhizobium or Arthrobacter is used as the enzyme converting the N-carbamyl-D-.alpha.-amino acid to the D-.alpha.-amino acid.The conversion of the N-carbamyl-D-.alpha.-amino acids to the D-.alpha.-amino acids is carried out in a neutral to alkaline pH range.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: January 26, 1999
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Hideaki Yamada, Sakayu Shimizu, Yasuhiro Ikenaka, Kazuyoshi Yajima, Yukio Yamada, Hirokazu Nanba, Masayuki Takano, Satomi Takahashi
  • Patent number: 5739043
    Abstract: A method for producing a substrate for forming a polysilicon thin film by forming an amorphous silicon film of a thickness not more than 200 .ANG., irradiating excimer laser light onto the amorphous silicon film to crystallize silicon particles contained in the amorphous silicon film; and irradiating the amorphous silicon film with hydrogen radicals to etch the amorphous silicon film.
    Type: Grant
    Filed: February 12, 1996
    Date of Patent: April 14, 1998
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventor: Kenji Yamamoto
  • Patent number: 5691433
    Abstract: A silicon-containing polymer comprising a structural unit of the formula (1): ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and represent a monovalent organic group having 1 to 20 carbon atoms, and the benzene ring may have a substituent, which has good heat resistance.
    Type: Grant
    Filed: March 28, 1996
    Date of Patent: November 25, 1997
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Jun Kotani, Manabu Tsumura, Takahisa Iwahara, Toshifumi Hirose
  • Patent number: 5668194
    Abstract: This invention relates to a room temperature curing composition for use in various coatings for interior and exterior sidings, automotive bodies, household electrical appliances and plastic substrates and particularly for coatings required to have weather resistance and durability. The room temperature curing composition of this invention comprises an emulsion obtained by a multi-stage polymerization of monomers, said emulsion comprising emulsion particles, the core of which is formed by polymerization of (A) a silyl group-containing vinyl monomer, (B) an alkyl or cycloalkyl methacrylate whose alkyl moiety contains not less than 4 carbon atoms, and (C) a non-hydrophilic vinyl monomer other than (B) and the outer shell of which is formed by polymerization of (A), (B), (C) and (D) a hydrophilic vinyl monomer. The room temperature curing composition of this invention features a high stability of silyl groups it contains and a remarkably improved film-forming property even after prolonged storage.
    Type: Grant
    Filed: December 14, 1995
    Date of Patent: September 16, 1997
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Naotami Ando, Toshiyuki Masuda, Takanori Hatano, Kazuya Nakayama
  • Patent number: 5652276
    Abstract: A foaming resin composition consisting essentially of (A) an organic compound having a carbon-carbon double bond, (B) a compound having an SiH group, and (C) a compound having an OH group is foamed and cured at room temperature or under heat at relatively low temperatures, to obtain hard, semi-hard or soft plastic foam having good weather resistance and good compatibility with coating compositions and adhesives.
    Type: Grant
    Filed: September 5, 1996
    Date of Patent: July 29, 1997
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Hiroshi Ando, Kensuke Kondo, Naoaki Nakanishi, Hiroshi Ito, Shigeki Hamaguchi, Kazuya Yonezawa
  • Patent number: 5631082
    Abstract: a tape or sheet form pressure-sensitive adhesive material which comprises a substrate which is obtainable by curing a curable resin composition comprising:(A) an organic elastomeric polymer which is liquid at room temperature and has, in a molecule, at least one silicon-containing group to the silicon atom of which at lease one hydroxyl group or hydrolyzable group is bonded and which is cross linkable through formation of a siloxane bond,(B) a curing catalystand(C) optionally a tackifier resin and a pressure-sensitive adhesive layer laminated on said substrate, which has good flexibility and increased adhesive force such as adhesive strength under shear and peel strength.
    Type: Grant
    Filed: August 30, 1993
    Date of Patent: May 20, 1997
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Toshifumi Hirose, Katsuhiko Isayama
  • Patent number: 5626982
    Abstract: A heat insulating pad material, particularly for use in a battery shield, is made of a molded foam with a rough surface produced by in-mold expansion molding of expandable resin beads, a facing of a high-melting resin film, and an intermediate layer of a low-melting resin film. The foam and the facing are laminated together by melting the low-melting resin film in a manner that the rough surface is transparent through the facing. Upon lamination, heat may be applied onto the facing under pressure to emboss the rough surface of the molded foam, thus imparting a textured pattern. A heat insulating assembly for a battery comprises a battery case having outer surface walls and a pad of a one-piece pad member or pad members fayed and secured to the walls in a covering manner. The pad may be of the aforementioned pad material as well as molded foams produced by in-mold expansion molding or extrusion molding.
    Type: Grant
    Filed: February 27, 1995
    Date of Patent: May 6, 1997
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Tamotsu Kawai, Masao Ando, Masahiro Chikada, Yoshihiro Yamamoto
  • Patent number: 5580925
    Abstract: An organic polymer having at least two hydrosilyl groups in a molecule is mixed with an organic polymer having at least one alkenyl group in a molecule and a hydrosilylation catalyst to give a composition. Such composition is rapidly curable, has good depth curability and gives a cured material having good mechanical properties.
    Type: Grant
    Filed: October 29, 1990
    Date of Patent: December 3, 1996
    Assignee: Kanegafuchi Chemical Industry, Co., Ltd.
    Inventors: Takahisa Iwahara, Makato Chiba, Tomoko Takahara, Kazuya Yonezawa
  • Patent number: 5567833
    Abstract: A curable composition which comprises(C) a non-polymeric organic curing agent having at least two hydrosilyl groups in a molecule,(D) an organic polymer having at least one alkenyl group in a molecule, and(E) a hydrosilylation catalysthas rapid curability and good depth curability, and gives a homogeneous cured material having good mechanical properties.
    Type: Grant
    Filed: September 26, 1994
    Date of Patent: October 22, 1996
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Takahisa Iwahara, Makoto Chiba, Tomoko Takahara, Kazuya Yonezawa
  • Patent number: 5517037
    Abstract: The polysilicon thin film of the present invention is formed on a glass substrate or the like having a particulate product of SiO.sub.x (0<x.ltoreq.2) of size not more than 100 .ANG., for example, dispersed into not more than 100 pieces in an area of 0.1 .mu.m square. Furthermore, in the production method of a polysilicon thin film of the present invention, a particulate product of SiO.sub.x (0<x.ltoreq.2) of size not more than 100 .ANG., for example, dispersed into not more than 100 pieces in an area of 0.1 .mu.m square, is formed on a substrate, and thereafter a polysilicon thin film is grown using this particulate product as a nucleus.
    Type: Grant
    Filed: November 23, 1993
    Date of Patent: May 14, 1996
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventor: Kenji Yamamoto
  • Patent number: 5514469
    Abstract: A magnetoresistance effect element having a substrate, a buffer layer of a metal selected from the group consisting of chromium, tungsten, titanium, vanadium, manganese and their alloys which is formed on the substrate, and at least two magnetic thin layers which are laminated with interposing a non-magnetic thin layer therebetween on the metal thin layer, wherein adjacent magnetic thin layers through the non-magnetic thin layer have different coercive forces. This magnetoresistance effect element has an increased magnetoresistance ratio.
    Type: Grant
    Filed: January 17, 1995
    Date of Patent: May 7, 1996
    Assignees: Ube Industries, Ltd., Kanegafuchi Chemical Industry Co., Ltd., Nippon Steel Corporation, TDK Corporation, Tosoh Corporation, Toyo Boseki Kabushiki Kaisha, Japan Energy Corporation, NEC Corporation, Matsushita Electric Industrial Co., Ltd., Seisan Kaihatsu Kagaku Kenkyusho
    Inventors: Teruya Shinjo, Hidefumi Yamamoto, Toshihiko Anno, Toshio Takada
  • Patent number: 5504235
    Abstract: When a polysiloxane or siloxane is contacted with a mixture which comprises an orthoester, a compound having an active hydrogen-containing group and an acid catalyst, it is easily decomposed even at room temperature to provide a silicon compound having a lower molecular weight such as an alkoxysilane.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: April 2, 1996
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Toshifumi Hirose, Ryotaro Tsuji, Katsuya Ouchi
  • Patent number: 5500464
    Abstract: A two-pack type curable composition comprising:A. a first liquid containing an organic elastomeric polymer having at least one silicon-containing reactive group in a molecule and a curing agent for an epoxy resin, andB. a second liquid containing an epoxy resin, at least one organic tin compound selected from the group consisting of compounds of the formulae: ##STR1## wherein R.sup.1 is a monovalent hydrocarbon group, and R.sup.2 is a monovalent aliphatic hydrocarbon group having 7 to 19 carbon atoms, and an inorganic filler, which composition has good storage stability.
    Type: Grant
    Filed: January 10, 1994
    Date of Patent: March 19, 1996
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Michihide Homma, Atsuko Yoshihara, Hiroshi Wakabayashi, Katsuhiko Isayama
  • Patent number: 5461102
    Abstract: A monomer mixture (B) containing a vinyl monomer having a functional silyl group of the general formula (ii) is subjected to emulsion polymerization in an aqueous solution of a water-soluble resin (A) having a functional silyl group of the general formula (i) the water-soluble resin [A] is synthesized using, as a polymerization solvent, a water-soluble organic solvent containing a (poly)ethylene glycol monoalkyl ether of the general formula HO--(CH.sub.2 CH.sub.2 O).sub.n --R.sup.3 or a (poly)propylene glycol monoalkyl ether of the general formula HO--(C.sub.3 H.sub.6 O).sub.n --R.sup.4 ; ##STR1## wherein R.sup.1 and R.sup.
    Type: Grant
    Filed: July 6, 1993
    Date of Patent: October 24, 1995
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Toshiyuki Masuda, Takanori Hatano, Naotami Ando