Patents Assigned to Kazuo Terashima
  • Substrate electrode plasma generator and substance/material processing method
    Patent number: 6538387
    Abstract: The substrate electrode plasma generating apparatus is constituted of an array of small gap thin film electrode pairs 1, 2, 3, and 4 formed by sputtering and dry etching tungsten on a silicon substrate 5 with an oxidized surface.
    Type: Grant
    Filed: May 23, 2000
    Date of Patent: March 25, 2003
    Assignees: Seiko Epson Corporation, Kazuo Terashima
    Inventors: Shunichi Seki, Tatsuya Shimoda, Takeshi Izaki, Kazuo Terashima