Patents Assigned to KEM-TEC Japan Co., Ltd.
  • Publication number: 20020051915
    Abstract: The object is to provide a printed board manufacturing apparatus, printed board manufacturing method and a printed board produced thereby, in which stepwise exposures of an original photomask can be performed with an improved production yield by taking into account identification markings.
    Type: Application
    Filed: November 20, 2001
    Publication date: May 2, 2002
    Applicant: KEM-TEC JAPAN CO., LTD.
    Inventor: Hamataro Karamatsu
  • Patent number: 6151796
    Abstract: A substrate drying device includes a reduced pressure enclosure including an airproof door, and an exhaustion device. Inside of the enclosure is caused to be a sealed state when the airproof door is closed. After a substrate to which an application material is applied is received into the reduced pressure enclosure, the airproof door is closed to make inside of the reduced pressure enclosure be an airproof state. Subsequently, inside of the reduced pressure enclosure is exhausted by the exhaustion device to perform for eliminating air bubbles in the application material and drying the application material on the substrates. The exhaustion device may include a reserve tank that has a volume capable of rapidly reducing a pressure of the internal volume of the reduced pressure enclosure to maintain a predetermined negative pressure. A rapid exhaustion of the inside of the reduced pressure enclosure is performed by connecting the reserve tank to the reduced pressure enclosure.
    Type: Grant
    Filed: December 21, 1998
    Date of Patent: November 28, 2000
    Assignee: KEM-TEC Japan Co., Ltd.
    Inventors: Hamataro Karamatsu, Masanao Hori, Seiji Katayama