Abstract: A method of patterning a combined layer of an electrically-conductive film, such as indium-tin-oxide (ITO), that is disposed on a flexible substrate includes bending the combined layer about a radius of curvature. The combined layer is initially bent in a first direction so that the electrically-conducive film is distal to the radius of curvature, so as to form initial dielectric lines in the electrically-conductive film. The combined layer is then bent in another direction so that the electrically-conductive film is proximate to the radius of curvature to further enhance the dielectric performance of the initial dielectric lines. The dielectric lines electrically isolate a portion of the electrically-conductive film that is disposed therebetween, to form an electrically conductive electrode.
Type:
Grant
Filed:
December 30, 2014
Date of Patent:
November 10, 2020
Assignee:
KENTA STATE UNIVERSITY
Inventors:
John West, Da-Wei Lee, Paul Anders Olson