Patents Assigned to Kimoto Tech, Inc.
  • Patent number: 5521002
    Abstract: Disclosed is a ink receiving matte coating composition and ink receiving media ink jet printing which comprises a transparent, translucent, or opaque base support, such as polyester film, on to which a matte, opaque ink receptive layer is applied on at least one side. The ink receptive matte coating composition of the present invention is comprised of one or more hydrophilic, water soluble polymers, a hydrophobic cellulose ether polymer, a polyalkylene glycol, and a filler, or filler/pigment combination, for making the layer opaque. The ink receiving media described herein allows for quick drying of ink jet printing inks while controlling the edge sharpness of the printed areas and is resistant to moisture and humidity effects, such as fingerprinting, slowed ink drying times, and easy removal of the coated ink receptive layer with moisture, thus increasing its value as an archivable storage media for ink jet printed images.
    Type: Grant
    Filed: January 18, 1994
    Date of Patent: May 28, 1996
    Assignee: Kimoto Tech Inc.
    Inventor: Michael C. Sneed
  • Patent number: 5399832
    Abstract: A grounded electrode and a high-voltage applying electrode, each obtained by covering a metal electrode with a dielectric are housed at least within a reactor apparatus. A rare gas can be introduced in the apparatus by way of a gas delivery tube, and a monomer gas can be admitted in the apparatus by way of a gas delivery tube. An additional gas may also be introduced in the apparatus by way of a gas delivery tube. The employed gases may be discharged from within the reactor by way of a discharge tube. Powders are charged in the apparatus with a rare gas, monomer gas, or combination thereof and, optionally, additional gases may be included, the gas components being selected based upon what type of electrical power is to be treated. Powers ape supplied to the electrodes to induce atmospheric-pressure plasma reactions, thereby modifying or enhancing the characteristics of the powders.
    Type: Grant
    Filed: August 3, 1992
    Date of Patent: March 21, 1995
    Assignees: Kimoto Co., Ltd., Kimoto Tech, Inc., Satiko Okazaki, Masuhiro Kogoma
    Inventors: Tatsuzo Tanisaki, Satiko Okazaki, Masuhiro Kogoma
  • Patent number: 5340618
    Abstract: A method is disclosed for the treatment of a powder by use of a plasma reactor under atmospheric pressure, comprising the steps of providing a reaction chamber having first and second electrodes covered with a dielectric, an upper gas exhaust means and a lower gas inlet means, feeding a fluidizing gas comprising a rare gas, a monomer gas or a mixture thereof through said gas inlet means into said chamber to agitate a powder to be treated in said chamber, concurrently removing said gas from said chamber through said gas exhaust means; and generating a glow plasma under atmospheric pressure in said chamber by applying a voltage to said first electrode and grounding said second electrode whereby said powder is provided with an anticorrosive surface treatment.
    Type: Grant
    Filed: July 21, 1992
    Date of Patent: August 23, 1994
    Assignees: Kimoto Co., Ltd., Kimoto Tech, Inc., Satiko Okazaki, Masuhiro Kogoma
    Inventors: Tatsuzo Tanisaki, Satiko Okazaki, Masuhiro Kogoma