Abstract: Multi-layer devices comprising a layer of an electrochromic lithium nickel oxide composition on a first substrate, the lithium nickel oxide composition comprising lithium, nickel and a Group 4 metal selected from titanium, zirconium, hafnium and a combination thereof.

Abstract: Multi-layer electrochromic structures comprising an anodic electrochromic layer comprising a lithium nickel oxide composition on a first substrate, the anodic electrochromic layer comprising lithium, nickel and a Group 4 metal selected from titanium, zirconium, hafnium and a combination thereof, wherein (i) the atomic ratio of lithium to the combined amount of nickel and such Group 4 metal(s) in the anodic electrochromic layer is at least 0.4:1, respectively, (ii) the atomic ratio of the amount of such Group 4 metal(s) to the combined amount of nickel and such Group 4 metal(s) in the anodic electrochromic layer is at least about 0.025:1, respectively, and (iii) the anodic electrochromic layer exhibits an interplanar distance (d-spacing) of at least 2.5 ? as measured by X-ray diffraction (XRD), comprises at least 0.05 wt. % carbon, and/or has a coloration efficiency absolute value of at least 19 cm2/C.

Abstract: Process for preparing a multi-layer electrochromic structure comprising depositing a film of a liquid mixture onto a substrate and treating the deposited film to form an anodic electrochromic layer comprising a lithium nickel oxide composition, the anodic electrochromic layer comprising lithium, nickel and the bleached state stabilizing element(s) wherein in the film (i) the ratio of lithium to the combined amount of nickel and the bleached state stabilizing element(s) is at least 0.4:1, (ii) the ratio of the combined amount of the bleached state stabilizing element(s) to the combined amount of nickel and the bleached state stabilizing elements in the lithium nickel oxide composition is at least about 0.025:1, and (iii) the bleached state stabilizing element(s) is/are selected from the group consisting of Y, Ti, Zr, Hf, V, Nb, Ta, Mo, W, B, Al, Ga, In, Si, Ge, Sn, P, Sb and combinations thereof.

Abstract: Multi-layer devices comprising a layer of an electrochromic lithium nickel oxide composition on a first substrate, the lithium nickel oxide composition comprising lithium, nickel and a Group 5 metal selected from niobium, tantalum and a combination thereof.

Abstract: Multi-layer electrochromic structures comprising an anodic electrochromic layer comprising a lithium nickel oxide composition on a first substrate, the anodic electrochromic layer comprising lithium, nickel and a Group 5 metal selected from niobium, tantalum and a combination thereof, wherein (i) the atomic ratio of lithium to the combined amount of nickel, niobium and tantalum in the anodic electrochromic layer is at least 0.4:1, respectively, (ii) the atomic ratio of the combined amount of niobium and tantalum to the combined amount of nickel, niobium and tantalum in the anodic electrochromic layer is at least about 0.025:1, respectively, and (iii) the anodic electrochromic layer exhibits an interplanar distance (d-spacing) of at least 2.5 ? as measured by X-ray diffraction (XRD), comprises at least 0.05 wt. % carbon, and/or has a coloration efficiency absolute value of at least 19 cm2/C.

Abstract: Process for preparing a multi-layer electrochromic structure comprising depositing a film of a liquid mixture onto a substrate and treating the deposited film to form an anodic electrochromic layer comprising a lithium nickel oxide composition, the anodic electrochromic layer comprising lithium, nickel and the bleached state stabilizing element(s) wherein in the film (i) the ratio of lithium to the combined amount of nickel and the bleached state stabilizing element(s) is at least 0.4:1, (ii) the ratio of the combined amount of the bleached state stabilizing element(s) to the combined amount of nickel and the bleached state stabilizing elements in the lithium nickel oxide composition is at least about 0.025:1, and (iii) the bleached state stabilizing element(s) is/are selected from the group consisting of Y, Ti, Zr, Hf, V, Nb, Ta, Mo, W, B, Al, Ga, In, Si, Ge, Sn, P, Sb and combinations thereof.

Abstract: A multi-layer device comprising a first substrate and a first electrically conductive layer on a surface thereof, the first electrically conductive layer having a sheet resistance to the flow of electrical current through the first electrically conductive layer that varies as a function of position.

Abstract: A multi-layer device comprising a first substrate, a first electrically conductive layer and a first current modulating structure on a surface thereof, the first current modulating structure comprising a composite of a resistive material and a patterned insulating material, the first current modulating structure having a cross-layer resistance to the flow of electrical current through the first current modulating structure that varies as a function of position.

Abstract: A multi-layer device comprising a first substrate and a first electrically conductive layer on a surface thereof, the first electrically conductive layer having a sheet resistance to the flow of electrical current through the first electrically conductive layer that varies as a function of position.

Abstract: A multi-layer device comprising a first substrate, a first electrically conductive layer on a surface thereof, and a first current modulating layer, the first electrically conductive layer having a sheet resistance to the flow of electrical current through the first electrically conductive layer that varies as a function of position.