Patents Assigned to Kisco Ltd.
  • Publication number: 20240261191
    Abstract: An opening detection sheet to be attached to a packaging material includes a metal layer, an IC, an insulating layer, and a first adhesive layer. The metal layer is releasable from the packaging material and includes a slit. The IC is mounted on the metal layer so as to cover at least a portion of the slit and for communicating with an external device. The insulating layer is disposed on an opposite side from the IC with respect to the metal layer. The first adhesive layer is bonded to the insulating layer on an opposite side from the metal layer so as to be bonded to the packaging material.
    Type: Application
    Filed: June 8, 2022
    Publication date: August 8, 2024
    Applicants: UACJ CORPORATION, UACJ FOIL CORPORATION, KISCO LTD., UNI TAG LTD.
    Inventors: Hisaya KATO, Tomoki TAKEDA, Tomohiro MAEDA, Yosuke TAKAGI, Masaki TAKAISHI, Daisuke ASADA, Shinji KANEKO
  • Patent number: 9492842
    Abstract: Provided is: a cell culture membrane, which is free from materials derived from living organisms, can easily be industrially mass-produced, exhibits superior long-term storage properties and chemical resistance, has excellent cell adhesion properties and long-term culture properties and is capable of replicating a cell adhesion morphology that is similar to that of collagen derived from living organisms and being used for conventional cell cultivation. Also provided are a cell culture substrate, and a method for manufacturing the cell culture substrate. In the present invention, as a cell adhesion layer, a polymer membrane represented by formula (I) is formed on the base of a cell culture substrate so as to have a membrane thickness equal to or greater than 0.2 ?m (in the formula, R1 and R2 represent a —(CH2)n—NH2 moiety (n is an integer of 1-10 inclusive.) or H, with at least one of R1 and R2 being a —(CH2)n—NH2 moiety. Moreover, l and m are positive integers expressing polymerization degree).
    Type: Grant
    Filed: June 22, 2012
    Date of Patent: November 15, 2016
    Assignees: KISCO LTD., DAISANKASEI CO., LTD., The University of Tokyo
    Inventors: Yasuo Yoshimoto, Kentaro Kamimae, Yuki Tanabe, Taku Oguni, Takashi Inoue, Tsutomu Mochizuki, Makoto Hirama, Teruo Fujii, Hiroshi Kimura, Hideto Tozawa
  • Publication number: 20140212974
    Abstract: Provided is: a cell culture membrane, which is free from materials derived from living organisms, can easily be industrially mass-produced, exhibits superior long-term storage properties and chemical resistance, has excellent cell adhesion properties and long-term culture properties and is capable of replicating a cell adhesion morphology that is similar to that of collagen derived from living organisms and being used for conventional cell cultivation. Also provided are a cell culture substrate, and a method for manufacturing the cell culture substrate. In the present invention, as a cell adhesion layer, a polymer membrane represented by formula (I) is formed on the base of a cell culture substrate so as to have a membrane thickness equal to or greater than 0.2 ?m (in the formula, R1 and R2 represent a —(CH2)n—NH2 moiety (n is an integer of 1-10 inclusive.) or H, with at least one of R1 and R2 being a —(CH2)n—NH2 moiety. Moreover, l and m are positive integers expressing polymerization degree).
    Type: Application
    Filed: June 22, 2012
    Publication date: July 31, 2014
    Applicants: KISCO LTD., THE UNIVERSITY OF TOKYO, DAISANKASEI CO., LTD.
    Inventors: Yasuo Yoshimoto, Kentaro Kamimae, Yuki Tanabe, Taku Oguni, Takashi Inoue, Tsutomu Mochizuki, Makoto Hirama, Teruo Fujii, Hiroshi Kimura, Hideto Tozawa
  • Patent number: 8383409
    Abstract: The invention is directed to methods for the propagation or cultivation of cells including preparing a cell culture substrate, wherein the cell culture substrate includes a substrate and a layer formed by surface modification. The layer includes a polymer containing an amino group. The polymer is produced by reacting a polymer represented by formula (II): with a polymer having at least one amino group, —NH2, capable of forming a Schiff base in a monomer of formula (II), thereby forming a polymer layer constituting the layer formed by surface modification. “n” in Formula (II) is 0 or a positive integer, and m is a positive integer. n and m represent the degree of polymerization. Formula (II) is formed by chemical vapor deposition of formyl[2.2]paracyclophane. The methods further include providing cells in a medium; inoculating the cells onto the cell culture substrate; and culturing the cells, wherein the cells adhere to the cell culture substrate.
    Type: Grant
    Filed: February 3, 2011
    Date of Patent: February 26, 2013
    Assignees: Kisco Ltd., Daisan Kasei Co., Ltd., The University of Tokyo
    Inventors: Shin Ohya, Takashi Inoue, Takatoki Yamamoto, Teruo Fujii, Yasuyuki Sakai, Masaki Nishikawa, Hitomi Sakai, Hirosuke Naruto
  • Publication number: 20100034970
    Abstract: A chemical vapor deposition apparatus includes a charging section 10 for charging a feedstock material for vapor deposition, a decomposition oven 2 for decomposing a feedstock material for vapor deposition, an opening/closing valve 4 for interconnecting the charging section 10 and the decomposition oven 2, and a polymerization section 3 for polymerizing the feedstock material decomposed by the decomposition oven for depositing a coating film on the surface of a substrate. The feedstock material for vapor deposition charged into the charging section 10 is vaporized, and the so vaporized feedstock material is delivered to the decomposition oven 2 by opening the opening/closing valve 4 to deposit the coating film.
    Type: Application
    Filed: July 28, 2006
    Publication date: February 11, 2010
    Applicants: DAISANKASEI CO., LTD., KISCO LTD.
    Inventors: Tsutomu Mochizuki, Takashi Inoue, Kazuyoshi Uetake