Patents Assigned to Kishimoto Sangyo Co., Ltd.
  • Patent number: 7695855
    Abstract: There is provided an electrode for a lithium secondary battery where particles, composed of an active material capable of occluding and releasing lithium, are arranged on a current collector, the active material particle being directly bonded to the surface of the current collector in a state where the bottom of the active material particle is imbedded in a concave portion formed on the surface of the current collector. A second particle layer may be provided on a first particle layer comprising the active material particles directly bonded to the surface of the current collector.
    Type: Grant
    Filed: April 19, 2005
    Date of Patent: April 13, 2010
    Assignees: Sanyo Electric. Co., Ltd., Kishimoto Sangyo Co., Ltd.
    Inventors: Takuya Sunagawa, Yasuyuki Kusumoto, Shin Fujitani, Kensuke Nakatani, Muneto Kobayashi
  • Patent number: 7579307
    Abstract: The invention has for its object the provision of a cleaner capable of removing particles and metal impurities present on the surface of a wafer without corrosion of wirings, gates or the like yet at normal temperature in a short period of time and with a one-pack type solution. To accomplish the above object, the invention provides a cleaner that is an aqueous solution containing phosphoric acid, hydrofluoric acid, and ammonia and/or amine, and having a pH ranging from 2 to 12, wherein the aqueous solution comprises 0.5 to 25 mass % of phosphoric acid, 0.1 to 10 mass % of ammonia and/or amine, and 5×10?3 to 5.0 mass % of hydrofluoric acid.
    Type: Grant
    Filed: November 24, 2004
    Date of Patent: August 25, 2009
    Assignees: Kishimoto Sangyo Co., Ltd., Fine Polymers Corporation
    Inventors: Shigemasa Suga, Shigeru Kamon, Takashi Yata, Akihiro Terai
  • Publication number: 20090042295
    Abstract: A cell culture substrate which is durable and which can be readily produced in commercial scale at a low cost, and its production method are provided. The cell culture substrate comprises a substrate and a layer formed by surface modification, which comprises a polymer containing amino group produced by reacting a polymer represented by the following formula (II): (wherein n is 0 or a positive integer, and m is a positive integer, the n and m representing degree of polymerization) formed by chemical vapor deposition of formyl[2.2]paracyclophane represented by the following formula (I): (wherein k is 0 or 1) with a polymer having at least one amino group (—NH2) capable of forming Schiff base in its monomer. The production method of the cell culture substrate comprises the step of synthesizing such polymer on the substrate.
    Type: Application
    Filed: August 8, 2007
    Publication date: February 12, 2009
    Applicants: KISHIMOTO SANGYO CO., LTD., DAISANKASEI CO., LTD., THE UNIVERSITY OF TOKYO
    Inventors: Shin Ohya, Takashi Inoue, Takatoki Yamamoto, Teruo Fujii, Yasuyuki Sakai, Masaki Nishikawa, Hitomi Sakai, Hirosuke Naruto
  • Publication number: 20070105735
    Abstract: The invention has for its object the provision of a cleaner capable of removing particles and metal impurities present on the surface of a wafer without corrosion of wirings, gates or the like yet at normal temperature in a short period of time and with a one-pack type solution. To accomplish the above object, the invention provides a cleaner that is an aqueous solution containing phosphoric acid, hydrofluoric acid, and ammonia and/or amine, and having a pH ranging from 2 to 12, wherein the aqueous solution comprises 0.5 to 25 mass % of phosphoric acid, 0.1 to 10 mass % of ammonia and/or amine, and 5×10?3 to 5.0 mass % of hydrofluoric acid.
    Type: Application
    Filed: November 24, 2004
    Publication date: May 10, 2007
    Applicants: Kishimoto Sangyo Co., Ltd, Fine Polymers Corporation
    Inventors: Shigemasa Suga, Shigeru Kamon, Takashi Yata, Akihiro Terai
  • Patent number: 6855419
    Abstract: This invention attempts to provide a method for producing a DNA chip which can be accomplished in simple steps at a low cost, and wherein use of the resulting DNA chip reduces loss of probes and sample substances in the washing step enabling efficient use of such probe and sample. This invention also attempts to provide a DNA chip produced by such method. Accordingly, a method for producing a DNA chip comprising a substrate and a DNA-binding layer formed on the substrate wherein said DNA-binding layer is a diamond like film having a DNA-binding group is provided, and this method comprises the steps of: reducing pressure of a vacuum chamber to a predetermined degree of vacuum; feeding the chamber with a gas which is the source of said diamond like film; feeding the chamber with a gas which is the source of nitrogen; and forming the diamond like film having a DNA-binding group on the substrate by CVD. Also provided is the DNA chip produced by such method.
    Type: Grant
    Filed: May 16, 2002
    Date of Patent: February 15, 2005
    Assignee: Kishimoto Sangyo Co., Ltd.
    Inventors: Eiichi Nakamura, Kenichi Shibayama, Hiroshi Maruyama, Takashi Inoue
  • Patent number: 6534459
    Abstract: The invention provides a nontoxic, undangerous resist residue remover that enables removal of resist residues to be carried out without metal corrosion or other problems and with safety. The remover is an aqueous solution containing ammonium phosphate and/or condensed ammonium phosphate and having a pH ranging from 1 to 10.
    Type: Grant
    Filed: August 9, 2000
    Date of Patent: March 18, 2003
    Assignee: Kishimoto Sangyo Co., Ltd.
    Inventors: Takashi Yata, Shigeki Terayama, Yutaka Koinuma, Takeru Ohgushi
  • Publication number: 20030012956
    Abstract: This invention provides a polymer thin film which is useful as a substrate for immobilizing a histocompatibility-imparting agent, an immunosuppressive agent, a bioreaction suppressive agent, or the like, and which can be used in imparting biocompatibility; its production method; a binder for a bio chip wherein loss of probe and sample substances in the washing step has been reduced to realize efficient use of such probe and sample; and its production method. In the present invention, the starting material represented by the following structural formula (I) is evaporated and heated to bring the material into monomer form. The material is then introduced into a vacuum deposition chamber maintained at a predetermined degree of vacuum wherein the material is deposited and polymerized on a substrate to obtain the polymer thin film. This polymer thin film is also used in producing the bio chip.
    Type: Application
    Filed: May 16, 2002
    Publication date: January 16, 2003
    Applicant: KISHIMOTO SANGYO CO., LTD.
    Inventors: Eiichi Nakamura, Kenichi Shibayama, Hiroshi Maruyama, Takashi Inoue
  • Publication number: 20020197417
    Abstract: This invention attempts to provide a method for producing a DNA chip which can be accomplished in simple steps at a low cost, and wherein use of the resulting DNA chip reduces loss of probes and sample substances in the washing step enabling efficient use of such probe and sample. This invention also attempts to provide a DNA chip produced by such method. Accordingly, a method for producing a DNA chip comprising a substrate and a DNA-binding layer formed on the substrate wherein said DNA-binding layer is a diamond like film having a DNA-binding group is provided, and this method comprises the steps of: reducing pressure of a vacuum chamber to a predetermined degree of vacuum; feeding the chamber with a gas which is the source of said diamond like film; feeding the chamber with a gas which is the source of nitrogen; and forming the diamond like film having a DNA-binding group on the substrate by CVD. Also provided is the DNA chip produced by such method.
    Type: Application
    Filed: May 29, 2002
    Publication date: December 26, 2002
    Applicant: KISHIMOTO SANGYO CO., LTD.
    Inventors: Eiichi Nakamura, Kenichi Shibayama
  • Publication number: 20020166386
    Abstract: Method and apparatus for measuring elongation in a contactless manner capable of obtaining accurate measured value without attaching reference lines and capable of being automated, wherein laser beams are irradiated from two sensor sections each comprising a laser projector and a CCD camera to prescribed reference line positions at two positions on a test specimen, laser reflection lights are photographed respectively as speckle patterns each comprising a plurality of fringes respectively by the CCD cameras, the fringes at predetermined positions the speckle patterns are recognized on the coordinate of the CCD camera screens as targets correspondingly to the prescribed reference line positions at two positions respectively, and the moving amount on the pixel unit basis on the coordinate of the target fringes that move in accordance with the elongation of the test specimen are detected respectively to determine the elongation information of the test specimen, the fringes of the speckle patterns photographed by
    Type: Application
    Filed: April 20, 2001
    Publication date: November 14, 2002
    Applicant: KISHIMOTO SANGYO CO., LTD
    Inventor: Toshio Hiyoshi
  • Patent number: 6460418
    Abstract: Method and apparatus for measuring elongation in a contactless manner capable of obtaining accurate measured value without attaching reference lines and capable of being automated, laser beams are irradiated from two sensor sections each has a laser projector and a CCD camera to prescribed reference line positions at two positions on a test specimen, laser reflection lights are photographed respectively as speckle patterns with a plurality of fringes respectively by the CCD cameras, the fringes at predetermined positions the speckle patterns are recognized on the coordinate of the CCD camera screens as targets correspondingly to the prescribed reference line positions at two positions respectively, and the moving amount on the pixel unit basis on the coordinate of the target fringes that move in accordance with the elongation of the test specimen are detected respectively to determine the elongation information of the test specimen, the fringes of the speckle patterns photographed by the CCD cameras may be im
    Type: Grant
    Filed: April 20, 2001
    Date of Patent: October 8, 2002
    Assignee: Kishimoto Sangyo Co., Ltd.
    Inventor: Toshio Hiyoshi
  • Patent number: 6399695
    Abstract: The purposes of the present invention are to provide highly impact-resistant thermoplastic polyester resin inexpensively and promote the recycling of PET bottles, which are dumped as waste. To attain the purposes, a carboxyl-modified metallocene catalyzed polyolefin elastomer or a glycidyl methacrylate adduct to the elastomer is melt-blended with a thermoplastic polyester resin, particularly, the powder of recycled PET bottles. Additionally, a filler can be mixed, if necessary.
    Type: Grant
    Filed: June 30, 1998
    Date of Patent: June 4, 2002
    Assignee: Kishimoto Sangyo Co., Ltd.
    Inventors: Takeshi Moriwaki, Toshiharu Sakaguchi
  • Patent number: 6291072
    Abstract: A semiconductor device is provided with an interlayer insulating film consisting essentially of poly-&agr;,&agr;-difluoroparaxylylene. The interlayer insulating film can have a low relative dielectric constant of from 2.1 to 2.7.
    Type: Grant
    Filed: January 12, 1999
    Date of Patent: September 18, 2001
    Assignees: Kishimoto Sangyo Co., Ltd., Daisankasei Co., Ltd.
    Inventors: Hisao Kimoto, Tsutomu Mochizuki
  • Patent number: 6147042
    Abstract: The cleaner of the present invention contains, as an active ingredient, a polyphosphoric-acid-urea condensate or phosphoric-acid-urea polymer which is a reaction product from orthophosphoric acid and urea and is used for cleaning a metal surface and/or a glass surface in at least one process of a semiconductor device production process and a liquid crystal device production process. According to the present invention, an etching residue and impurities on metal (including semimetal) and glass surfaces can be cleaned off with high environmental and working safety and effectively without causing the problem of metal corrosion.
    Type: Grant
    Filed: July 2, 1999
    Date of Patent: November 14, 2000
    Assignees: Kishimoto Sangyo Co., Ltd., Otsuka Chemical Co., Ltd.
    Inventors: Takashi Yata, Yutaka Koinuma, Kazunori Fukumura, Yoshihito Fukumura
  • Patent number: 6075116
    Abstract: The present invention provides a highly impact resistant polyamide composition which comprises a polyamide resin and an acid modification product of a metallocene catalyzed polyolefin elastomer. The invention also provides a less hygroscopic and highly impact resistant polyamide composition which comprises a polyamide resin, novolak phenol and an acid modification product of a metallocene catalyzed polyolefin elastomer. Used as the polyamide resin is less expensive nylon 6.
    Type: Grant
    Filed: June 30, 1998
    Date of Patent: June 13, 2000
    Assignee: Kishimoto Sangyo Co., Ltd.
    Inventors: Takeshi Moriwaki, Toshiharu Sakaguchi
  • Patent number: 5965238
    Abstract: Portions of a thermoplastic synthetic resin panel (B) formed by extrusion and integrally having a first sheet (2a), a second sheet (2b) parallel to the first sheet (2a), and a plurality of ribs (3) integrally joining the first and second sheets (2a, 2b) are welded together by ultrasonic welding by applying an ultrasonic welding head (6) and a work support block (7) of an ultrasonic welding machine to the first sheet (2a) and the second sheet (2b), respectively, and compressing the portions of the thermoplastic synthetic resin panel (B) between the ultrasonic welding head (6) and the work support block (7).
    Type: Grant
    Filed: June 16, 1997
    Date of Patent: October 12, 1999
    Assignees: Kishimoto Sangyo Co., Ltd., Unitek Co., Ltd.
    Inventors: Tsuyoshi Saitoh, Kenjiro Hagiwara, Hisashi Sasaki
  • Patent number: 5941369
    Abstract: In a food conveying resin belt in which its conveying face is formed with a resin layer, an antibacterial and antifungal agent composition containing bis-(2-pyridylthio-1-oxido)-zinc as its active ingredient is included in the resin layer. High antibacterial and antifungal effects can be obtained by bis-(2-pyridylthio-1-oxido)-zinc.
    Type: Grant
    Filed: July 8, 1997
    Date of Patent: August 24, 1999
    Assignees: Mitsiboshi BeltingLtd., Kishimoto Sangyo Co., Ltd
    Inventors: Hiroshi Katsura, Nobuo Miyano, Kazuhiro Mizuno, Takao Endo
  • Patent number: 5498292
    Abstract: A heating device used for a gas phase growing mechanism or a heat treatment mechanism comprising a tubular reactor made of a heat resistant and chemically inert material incorporating a support having a plurality of works set and arranged thereon to be put to gas phase growing or heat treatment, a cylindrical main heating furnace body disposed so as to surround the outer circumferential surface of the tubular reactor 1 at the entire length thereof, and a pair of auxiliary heating furnace bodies each closing both longitudinal opening ends of the cylindrical main heating body, whereby the cylindrical main heating furnace body and the pair of auxiliary heating furnace bodies constitute a heating furnace for confining the tubular reactor therein.
    Type: Grant
    Filed: January 19, 1995
    Date of Patent: March 12, 1996
    Assignee: Kishimoto Sangyo Co., Ltd.
    Inventor: Yasushi Ozaki
  • Patent number: 5492980
    Abstract: Thermoplastic molding resin composition comprising 70-95 weight % of aliphatic polyamide, 5-30 weight % of phenolic resin, and 0-20 % of semi-aromatic amorphous polyamide, and further high density polyamide composition comprising 100 parts by weight of the mixture of 60-95 parts by weight of aliphatic crystalline polyamide, 5-30 parts by weight of phenolic resin, and 200-1000 parts by weight of metal powder or metal oxide powder or inorganic filler having specific gravity of more than 2.6.
    Type: Grant
    Filed: October 7, 1993
    Date of Patent: February 20, 1996
    Assignee: Kishimoto Sangyo Co., Ltd.
    Inventor: Takeshi Moriwaki
  • Patent number: D302119
    Type: Grant
    Filed: September 9, 1986
    Date of Patent: July 11, 1989
    Assignee: Kishimoto Sangyo Co., Ltd.
    Inventors: Isao Niwa, Mikio Ishimoto
  • Patent number: D302120
    Type: Grant
    Filed: September 9, 1986
    Date of Patent: July 11, 1989
    Assignee: Kishimoto Sangyo Co., Ltd.
    Inventors: Isao Niwa, Mikio Ishimoto