Abstract: One embodiment relates to an electronically-variable electrostatic immersion lens in an electron beam apparatus. The electrostatic immersion lens includes a top electrode configured with a first voltage applied thereto, an upper bottom electrode configured with a second voltage applied thereto, and a lower bottom electrode configured with a third voltage applied thereto. The third voltage is controlled separately from the second voltage. Other embodiments are also disclosed.
Type:
Grant
Filed:
October 26, 2005
Date of Patent:
November 4, 2008
Assignee:
KLA-Tencor Technologies Corproation
Inventors:
Mark A. McCord, Kirk J. Bertsche, Francisco Machuca