Abstract: There is described a method for reducing the surface area of silicon dioxide, which is characterized in that silicon dioxide is introduced into an electromagnetic shielding device selected from an aluminum/magnesium metal shielding device and a hypomagnetic chamber of Permalloy steel, and is incubated for a period of at least 3 hours, preferably at least 6 hours.
Type:
Grant
Filed:
November 8, 2002
Date of Patent:
May 24, 2005
Assignee:
Ökopharm Forschungs- und Entwicklungs-GmbH
Inventors:
Vlail Petrovic Kaznacheev, Aleksander Trofimov, Eugen Bren, Michael Ehrenberger, Stefan Ritzer, Peter Kössler, Norbert Fuchs