Abstract: A multi-cathode electron beam plasma etcher is disclosed. The multi-cathode electron beam plasma etcher is comprised of: a vacuum chamber; several cathodes which are installed in the upper end of the upper part of the chamber and generates an electron beam in order to generate plasma in a large area; an acceleration electrode and a deceleration electrode which, form an acceleration and a deceleration tube structure in order to withdraw much of the electron beam, are arranged sequentially from the front of the cathode, and form an electrostatic lens when the differential voltage is applied respectively; first vacuum evacuation device to made the upper part of the chamber vacuum; an etching gas injection device which is installed in the side wall around the upper end of the lower part of the chamber; second vacuum evacuation device which is installed in the lower part of the chamber; and a holder of the etched body which is installed in the lower part of the chamber.