Abstract: Disclosed is a plasma rapid thermal process apparatus having an improved plasma supply port for supplying atomic radicals to a rapid thermal process chamber. The supply port includes an inner tube and an outer tube. The inner tube has one end which is opened and connected to the discharge tube and the other end which is closed. The diameter of a closed portion of the other end is smaller than those of other portions of the other end. A first spray hole is formed around a side wall of the closed portion. The outer tube has one end which is opened such that the closed portion of the inner tube is inserted in the one end, and the other end at which a plurality of second spray holes is formed. The other end of the outer tube is spaced apart by a predetermined interval from the other closed end of the inner tube. With the improved supply port, it is possible to achieve a highly efficient and uniform thermal process with low thermal budget at low temperature.

Abstract: Disclosed herein is a heater module of a rapid thermal processing apparatus. The heater module comprises a heater reactor provided with reflectors, lamps, a cooling gas inlet unit, a quartz window, a quartz window fixing unit, and a cooling gas outlet unit. According to the present invention, since the lamps, reflectors and the like provided in the heater module are cooled during or after thermal processing steps, it is possible to maintain smooth operation thereof, to extend its usage life, and to reduce a preparation time of thermal processing steps. Further, as the respective reflectors adopt an independent structure for allowing the respective lamps to be installed therein in a one-on-one fashion, it is possible to achieve accurate control of a heating source. Furthermore, the lamps adopt a structure capable of effectively reflecting light emitted therefrom, resulting in an improvement in a thermal efficiency.