Patents Assigned to KORNMEYER CARBON-GROUP GMBH
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Patent number: 11981572Abstract: A method for water-efficient production of graphite of low density from paper includes steeping paper in a vessel in dimethyl sulfoxide to generate paper fibers, admixing polyacrylonitrile to the dissolved the paper fibers with stirring until formation of a paste or a mixture with pastelike consistency, introducing the paste into a mold and subsequently forcing excess liquid from the paste by pressing, to form a presscake, immersing the presscake subsequently in water for curing the polyacrylonitrile for a specified time, until polymerization of the polyacrylonitrile and formation of a cured presscake, initially drying the cured presscake in air at relatively high temperature up to 100° C., heating up the cured presscake for stabilization in air up to 250° C. to remove the residual moisture, and carbonizing the cured and dried presscake in an oven at >1000° C. and then graphitizing it at >2000° C. to give a low-density graphite block.Type: GrantFiled: October 26, 2023Date of Patent: May 14, 2024Assignee: Nippon Kornmeyer Carbon Group GmbHInventor: David Klein
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Publication number: 20240140806Abstract: A method for water-efficient production of graphite of low density from paper includes steeping paper in a vessel in dimethyl sulfoxide to generate paper fibers, admixing polyacrylonitrile to the dissolved the paper fibers with stirring until formation of a paste or a mixture with pastelike consistency, introducing the paste into a mold and subsequently forcing excess liquid from the paste by pressing, to form a presscake, immersing the presscake subsequently in water for curing the polyacrylonitrile for a specified time, until polymerization of the polyacrylonitrile and formation of a cured presscake, initially drying the cured presscake in air at relatively high temperature up to 100° C., heating up the cured presscake for stabilization in air up to 250° C. to remove the residual moisture, and carbonizing the cured and dried presscake in an oven at >1000° C. and then graphitizing it at >2000° C. to give a low-density graphite block.Type: ApplicationFiled: October 26, 2023Publication date: May 2, 2024Applicant: Nippon Kornmeyer Carbon Group GmbHInventor: David KLEIN
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Patent number: 11873559Abstract: A plasma boat for receiving wafers with partial damping of the plasma deposition comprises a number of boat plates spaced apart in parallel, which are provided with wafer holders for receiving upright wafers, in order to securely hold the wafers during transport and during the depositing process in a coating chamber, and wherein the boat plates are mechanically connected to one another by electrically insulating spacers. This provides a plasma boat, with regulated plasma deposition, which ensures a deposition on wafers that is uniform over the surface area thereof and has a constant layer thickness. This is achieved by a damping element (12) being respectively arranged between the wafer holders (16) located parallel to one another, between adjacent boat plates (15), and electrically insulated with respect to the latter on spacer elements (2).Type: GrantFiled: June 13, 2019Date of Patent: January 16, 2024Assignee: Nippon Kornmeyer Carbon Group GmbHInventor: Torsten Kornmeyer
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Publication number: 20220411270Abstract: A method for producing carbon or graphite foam parts with high purity level for high-temperature insulation under vacuum or protective gas, as insulating material or as filter material, includes the following steps: introducing dry, foamable starch (1) into an open-top container (2) having a round or angular cross section, until the base (3) of the container (2) is covered amply and uniformly with starch (1); introducing the container (2) partly filled with starch (1) into an oven (4), and heating the container (2) to a foaming temperature of >180° C. over a prolonged period of several hours to foam the starch (1), until the container (2) has filled completely with carbon foam (6); withdrawing the container (2) from the oven (4) and extracting the carbon foam (6) after sufficient cooling, and optionally portioning the carbon foam (6) into carbon foam parts (6.1).Type: ApplicationFiled: April 28, 2022Publication date: December 29, 2022Applicant: Nippon Kornmeyer Carbon Group GmbHInventors: Torsten KORNMEYER, David KLEIN, Michael GERADS
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Publication number: 20210363636Abstract: A plasma boat for receiving wafers with partial damping of the plasma deposition comprises a number of boat plates spaced apart in parallel, which are provided with wafer holders for receiving upright wafers, in order to securely hold the wafers during transport and during the depositing process in a coating chamber, and wherein the boat plates are mechanically connected to one another by electrically insulating spacers. This provides a plasma boat, with regulated plasma deposition, which ensures a deposition on wafers that is uniform over the surface area thereof and has a constant layer thickness. This is achieved by a damping element (12) being respectively arranged between the wafer holders (16) located parallel to one another, between adjacent boat plates (15), and electrically insulated with respect to the latter on spacer elements (2).Type: ApplicationFiled: June 13, 2019Publication date: November 25, 2021Applicant: Nippon Kornmeyer Carbon Group GmbHInventor: Torsten KORNMEYER
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Publication number: 20180119278Abstract: A PECVD boat has at least one boat plate for accommodating wafers, for transport into and out of vacuum coating chambers. The boat plate is oriented vertically and has a plurality of U-shaped accommodating slots for accommodating wafers, which slots are oriented in the longitudinal direction of the boat plate and are open at the top, in such a way that the wafers inserted into the accommodating slots are aligned with the plate line of the boat plate.Type: ApplicationFiled: April 13, 2016Publication date: May 3, 2018Applicant: KORNMEYER CARBON-GROUP GMBHInventors: Torsten KORNMEYER, Hans-Peter VOLK