Patents Assigned to KUANG-CHI CUTTING EDGE TECHNOLOGY LTD.
  • Patent number: 11512172
    Abstract: The present invention provides a radome substrate and a preparation method thereof. The radome substrate includes: 5 to 10 parts of polyphenylene ether resin, 70 to 85 parts of ceramic masterbatch, 10 to 15 parts of hollow microbead masterbatch, 1 to 3 parts of a compatibilizer, and 0.1 to 0.3 parts of a lubricant. The radome substrate prepared according to the method provided in the present invention has a high dielectric constant and stress cracking resistance performance.
    Type: Grant
    Filed: June 24, 2020
    Date of Patent: November 29, 2022
    Assignee: Kuang-Chi Cutting Edge Technology Ltd.
    Inventors: Ruopeng Liu, Zhiya Zhao, Maobiao Yuan
  • Patent number: 11456539
    Abstract: The disclosure discloses an absorbing metamaterial, including a plurality of metamaterial units that are periodically arranged, where the metamaterial unit includes: a first loop disposed on a first plane; and a second loop disposed on a second plane, where the first plane is perpendicular to the second plane, so that the first loop and the second loop are orthogonal. According to the foregoing technical solution in the disclosure, wave absorption in a large angle range can be implemented while ensuring wideband wave absorption.
    Type: Grant
    Filed: January 27, 2021
    Date of Patent: September 27, 2022
    Assignee: KUANG-CHI CUTTING EDGE TECHNOLOGY LTD.
    Inventors: Ruopeng Liu, Zhiya Zhao, Kangqiang Chen, Sucheng Li
  • Patent number: 11417950
    Abstract: The disclosure provides an integrated wave-absorbing and wave-transparent apparatus and a radome. The integrated wave-absorbing and wave-transparent apparatus includes: a wave-transparent structure, including a first substrate and a metal patch unit located on opposite surfaces of the substrate; and a wave-absorbing structure, disposed on the wave-transparent structure and including a first wave-absorbing unit and a second wave-absorbing unit that are perpendicular to each other, where the first wave-absorbing unit and the second wave-absorbing unit each includes: a second substrate; and a plurality of metal sections and a plurality of stop-bands that are located on surfaces of the second substrate, where the plurality of metal sections and the plurality of stop-bands are connected alternately to form an absorption ring, and the metal patch unit is configured to be perpendicular to each of an absorption ring of the first wave-absorbing unit and an absorption ring of the second wave-absorbing unit.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: August 16, 2022
    Assignee: KUANG-CHI CUTTING EDGE TECHNOLOGY LTD.
    Inventors: Ruopeng Liu, Zhiya Zhao, Kangqiang Chen, Sucheng Li
  • Patent number: 11145989
    Abstract: The disclosure discloses a controllable wave-absorbing metamaterial including a substrate and a metamaterial unit array layer. Each conductive geometric unit includes a first hollow structure, second hollow structures, and conductive geometric structures. The second hollow structures are respectively extended from four vertices of the first hollow structure, and the conductive geometric structure is disposed between each two adjacent second hollow structures. The first end of the second hollow structure is provided with a varactor diode connected to the conductive geometric structures at both sides, the second end of the second hollow structure is provided with a fixed capacitor and a fixed resistor; the fixed capacitor is connected to the conductive geometric structure at one side, and the fixed resistor is connected to the conductive geometric structure at the other side. Therefore, active adjustment on a wave-absorption frequency band can be implemented, and power consumption is very low.
    Type: Grant
    Filed: June 24, 2020
    Date of Patent: October 12, 2021
    Assignee: KUANG-CHI CUTTING EDGE TECHNOLOGY LTD.
    Inventors: Ruopeng Liu, Zhiya Zhao, Jinguo Huang, Mingjun Xing, Tian Zhou, Xingxing Huang